The influence of Au thickness on the structural, optical and electrical properties of ZnO/Au/ZnO multilayer films

被引:20
作者
Kim, Daeil [1 ]
机构
[1] Univ Ulsan, Sch Mat Sci & Engn, Ulsan 680749, South Korea
关键词
ZnO; Au; XRD; Figure of merit; Work function; THIN-FILMS; MAGNETRON;
D O I
10.1016/j.optcom.2011.10.043
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
Transparent and conductive ZnO/Au/ZnO (ZAZ) multilayer films were deposited on glass substrates by magnetron sputtering without intentional substrate heating. The thickness of Au interlayer was set at 1,2 and 3 nm. The observed structural, optical and electrical properties were dependent on the thickness of the Au interlayer. For all of the ZAZ films, the diffraction peaks in the XRD pattern were identified as the (002) and (103) planes of a ZnO films and the (111) plane of an Au interlayer. The ZAZ films with a 2 nm thick Au interlayer showed a higher figure of merit than the other ZAZ films prepared in this study, and they also demonstrated the relatively high work function of 5.13 eV. From these results, we concluded that a ZAZ film with a 2 nm thick Au interlayer is an alternative candidate for use as a transparent electrode in OLEDs and various flat panel displays. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:1212 / 1214
页数:3
相关论文
共 9 条
[1]   Fabrication and vacuum annealing of transparent conductive AZO thin films prepared by DC magnetron sputtering [J].
Fang, GJ ;
Li, DJ ;
Yao, BL .
VACUUM, 2002, 68 (04) :363-372
[2]   Room-temperature growth and optoelectronic properties of GZO/ZnO bilayer films on polycarbonate substrates by magnetron sputtering [J].
Gong, Li ;
Lu, Jianguo ;
Ye, Zhizhen .
SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2010, 94 (07) :1282-1285
[3]   NEW FIGURE OF MERIT FOR TRANSPARENT CONDUCTORS [J].
HAACKE, G .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (09) :4086-4089
[4]   Characterization of TiO2/Au/TiO2 films deposited by magnetron sputtering on polycarbonate substrates [J].
Kim, Daeil .
APPLIED SURFACE SCIENCE, 2010, 257 (03) :704-707
[5]   Characterization of low pressure annealed ITO/Au/ITO films prepared by reactive magnetron sputtering [J].
Kim, Daeil .
JOURNAL OF ALLOYS AND COMPOUNDS, 2010, 493 (1-2) :208-211
[6]   Influence of Au underlayer thickness on the electro-optical properties of ITO/Au layered films deposited by magnetron sputtering on unheated polycarbonate substrates [J].
Kim, Y. S. ;
Park, J. H. ;
Kim, Daeil .
VACUUM, 2008, 82 (06) :574-578
[7]   Fabrication and characterization of Ag intermediate transparent and conducting TiON/Ag/TiON multilayer films [J].
Kim, Y. S. ;
Lee, Y. J. ;
Heo, S. B. ;
Lee, H. M. ;
Kim, J. H. ;
Kim, S. K. ;
Chae, J. H. ;
Choi, J. I. ;
Kim, Daeil .
OPTICS COMMUNICATIONS, 2011, 284 (09) :2303-2306
[8]   Influence of nickel thickness on the properties of ITO/Ni/ITO thin films [J].
Park, J. H. ;
Chae, J. H. ;
Kim, Daeil .
JOURNAL OF ALLOYS AND COMPOUNDS, 2009, 478 (1-2) :330-333
[9]   Transparent conducting V-co-doped AZO thin films prepared by magnetron sputtering [J].
Suzuki, S ;
Miyata, T ;
Ishii, M ;
Minami, T .
THIN SOLID FILMS, 2003, 434 (1-2) :14-19