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Incorporation of Bi atoms in InP studied at the atomic scale by cross-sectional scanning tunneling microscopy
被引:12
作者:
Krammel, C. M.
[1
]
Roy, M.
[2
]
Tilley, J.
[2
]
Maksym, P. A.
[2
]
Zhang, L. Y.
[3
]
Wang, P.
[3
]
Wang, K.
[3
]
Li, Y. Y.
[3
]
Wang, S. M.
[3
,4
]
Koenraad, P. M.
[1
]
机构:
[1] Eindhoven Univ Technol, Dept Appl Phys, NL-5612 AZ Eindhoven, Netherlands
[2] Univ Leicester, Dept Phys & Astron, Univ Rd, Leicester LE1 7RH, Leics, England
[3] Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
[4] Chalmers Univ Technol, Dept Microtechnol & Nanosci, S-41296 Gothenburg, Sweden
关键词:
ARSENIC ANTISITE DEFECTS;
MOLECULAR-BEAM EPITAXY;
III-V SEMICONDUCTORS;
110;
SURFACES;
GROWTH;
GAAS;
SPECTROSCOPY;
GAAS1-XBIX;
BULK;
GAP;
D O I:
10.1103/PhysRevMaterials.1.034606
中图分类号:
T [工业技术];
学科分类号:
08 ;
摘要:
We show the potential of cross-sectional scanning tunneling microscopy to address structural properties of dilute III-V bismides by investigating Bi: InP. Bismuth atoms down to the second monolayer below the {110} InP surfaces, which give rise to three classes of distinct contrast, are identified with the help of density functional theory calculations. Based on this classification, the pair-correlation function is used to quantify the ordering of Bi atoms on the long range. In a complementary short-ranged study, we investigate the Bi ordering at the atomic level. An enhanced tendency for the formation of first-nearest-neighbor Bi pairs is found. In addition, the formation of small Bi clusters is observed whose geometries appear to be related to strong first-nearest-neighbor Bi pairing. We also identify growth related crystal defects, such as In vacancies, P antisites, and Bi antisites.
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页数:9
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