Incorporation of Bi atoms in InP studied at the atomic scale by cross-sectional scanning tunneling microscopy

被引:12
作者
Krammel, C. M. [1 ]
Roy, M. [2 ]
Tilley, J. [2 ]
Maksym, P. A. [2 ]
Zhang, L. Y. [3 ]
Wang, P. [3 ]
Wang, K. [3 ]
Li, Y. Y. [3 ]
Wang, S. M. [3 ,4 ]
Koenraad, P. M. [1 ]
机构
[1] Eindhoven Univ Technol, Dept Appl Phys, NL-5612 AZ Eindhoven, Netherlands
[2] Univ Leicester, Dept Phys & Astron, Univ Rd, Leicester LE1 7RH, Leics, England
[3] Chinese Acad Sci, Shanghai Inst Microsyst & Informat Technol, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
[4] Chalmers Univ Technol, Dept Microtechnol & Nanosci, S-41296 Gothenburg, Sweden
关键词
ARSENIC ANTISITE DEFECTS; MOLECULAR-BEAM EPITAXY; III-V SEMICONDUCTORS; 110; SURFACES; GROWTH; GAAS; SPECTROSCOPY; GAAS1-XBIX; BULK; GAP;
D O I
10.1103/PhysRevMaterials.1.034606
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We show the potential of cross-sectional scanning tunneling microscopy to address structural properties of dilute III-V bismides by investigating Bi: InP. Bismuth atoms down to the second monolayer below the {110} InP surfaces, which give rise to three classes of distinct contrast, are identified with the help of density functional theory calculations. Based on this classification, the pair-correlation function is used to quantify the ordering of Bi atoms on the long range. In a complementary short-ranged study, we investigate the Bi ordering at the atomic level. An enhanced tendency for the formation of first-nearest-neighbor Bi pairs is found. In addition, the formation of small Bi clusters is observed whose geometries appear to be related to strong first-nearest-neighbor Bi pairing. We also identify growth related crystal defects, such as In vacancies, P antisites, and Bi antisites.
引用
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页数:9
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