Block copolymer self-assembly in chemically patterned squares

被引:44
作者
Xu, Ji [1 ]
Russell, Thomas P. [1 ]
Ocko, Benjamin M. [2 ]
Checco, Antonio [2 ]
机构
[1] Univ Massachusetts, Dept Polymer Sci & Engn, Amherst, MA 01003 USA
[2] Brookhaven Natl Lab, Condensed Matter Phys & Mat Sci Dept, Upton, NY 11973 USA
基金
美国国家科学基金会;
关键词
SINGLE-LAYER FILMS; DIBLOCK COPOLYMER; NANOPATTERNED SURFACES; THIN-FILMS; ARRAYS; LITHOGRAPHY; CYLINDERS; NANOSTRUCTURES; GRAPHOEPITAXY; TEMPLATES;
D O I
10.1039/c0sm01066a
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The self-assembly of block copolymers thin films laterally confined within square geometries that are incompatible with the bulk packing symmetry of the block copolymer microdomains is investigated. The lateral confinement is provided by chemical patterns made by oxidation nanolithography of octadecyltrichlorosilane-coated silicon surfaces. We find that the size and shape of the confinement affect the order of the block copolymer microdomains and their packing symmetries. Specifically, if the size of the square pattern is smaller than the characteristic grain size the hexagonally packed microdomains form a single-crystal oriented along the edges of the pattern and with "edge-boundaries" located preferentially at the perimeter of the pattern. If the size of the pattern is comparable with the natural bulk period of the copolymer, the packing symmetry changes from hexagonal to square. In this case the ordering induced by the pattern edges becomes dominant allowing the square lattice to be more stable than the hexagonal one.
引用
收藏
页码:3915 / 3919
页数:5
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