Chromium electrodeposition from Cr(III) aqueous solutions

被引:89
作者
Giovanardi, Roberto [1 ]
Orlando, Gianpaolo [2 ]
机构
[1] Univ Modena & Reggio Emilia, Dept Mat Engn, I-41125 Modena, Italy
[2] Nitty Gritty Srl, I-41057 Spilamberto, MO, Italy
关键词
Chromium; Plating; Electrodeposition; Formic acid; Complexes; C ALLOY COATINGS; ELECTROCHEMICAL-BEHAVIOR; TRIVALENT; CHEMISTRY; BATH; ACID;
D O I
10.1016/j.surfcoat.2011.02.027
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The aim of this work is to study an alternative plating process to obtain chromium coatings through electrodeposition from baths containing trivalent chromium, as aqueous solutions of Cr (III) are significantly less dangerous, in terms of human health and environmental impact, as compared to the traditional Cr (VI) baths employed for this purpose. In order to overcome problems regarding the reduction of Cr (III) in aqueous solution, two approaches were followed: i) the possibility of co-depositing chromium along with a second metal, which could help the process of discharge of Cr3+ on the substrate; ii) the use of a specific ligand for the Cr3+ ion, which can generate easily reducible complexes at the metal-solution interphase. Both approaches led to interesting results: in particular, the co-deposition enabled us to obtain NiCr alloy with a high percentage of chromium, and the deposition using specific complexing agents allowed optimal bath compositions to be developed both for decorative and hard chromium plating. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:3947 / 3955
页数:9
相关论文
共 16 条
[1]  
[Anonymous], 1986, THEORY PRACTICE PULS
[2]  
Dubpernell G, 1963, MODERN ELECTROPLATIN
[3]   Chromium electrodeposition from Cr(VI) low concentration solutions [J].
Fontanesi, Claudio ;
Giovanardi, Roberto ;
Cannio, Maria ;
Soragni, Ercole .
JOURNAL OF APPLIED ELECTROCHEMISTRY, 2008, 38 (04) :425-436
[4]   Characterization of as-deposited and annealed Cr-C alloy coatings produced from a trivalent chromium bath [J].
Ghaziof, S. ;
Golozar, M. A. ;
Raeissi, K. .
JOURNAL OF ALLOYS AND COMPOUNDS, 2010, 496 (1-2) :164-168
[5]  
GUPTA V, 2001, J APPL ELECTROCHEM, V35, P15
[6]   MECHANISMS OF CHROMIUM ELECTRODEPOSITION [J].
HOARE, JP .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (02) :190-199
[7]  
LASHMORE DS, 1986, PLAT SURF FINISH, V73, P48
[8]   Influence of ligand exchange on the treatment of trivalent chromium solutions by electrodialysis [J].
Rodrigues, MAS ;
Dalla Costa, RF ;
Bernardes, AM ;
Ferreira, JZ .
ELECTROCHIMICA ACTA, 2001, 47 (05) :753-758
[9]   Corrosion-electrochemical behavior of chromium deposits obtained from sulfuric acid solutions containing oxalates [J].
Safonov, VA ;
Vykhodtseva, LN ;
Edigaryan, AA ;
Aliev, AD ;
Molodkina, EB ;
Danilov, AI ;
Lubnin, EN ;
Polukarov, YM .
RUSSIAN JOURNAL OF ELECTROCHEMISTRY, 2001, 37 (02) :127-134
[10]  
Sargent G. J., 1920, T AM ELECTROCHEM SOC, V37, P479