Oxygen-vacancy engineering approach to bismuth basic nitrate/g-C3N4 heterostructure for efficiently photocatalytic hydrogen evolution

被引:21
作者
Sun, Shichang [1 ,2 ]
Zhou, Weiming [1 ]
Wang, Lingyi [1 ]
Zhang, Mingxin [1 ]
Lawan, Ibrahim [1 ]
Wang, Liwei [2 ]
Zhang, Fan [3 ]
Lin, Ming [1 ]
Yuan, Zhanhui [1 ]
机构
[1] Fujian Agr & Forestry Univ, Coll Mat Engn, Fuzhou 350002, Peoples R China
[2] Minjiang Univ, Ocean Coll, Fuzhou 350108, Peoples R China
[3] Shanghai Jiao Tong Univ, State Key Lab Met Matrix Composites, Sch Chem & Chem Engn, Shanghai 200240, Peoples R China
关键词
Bi6O6(OH)(3)(NO3)(3).1.5H(2)O/g-C3N4; Composite photocatalyst; Oxygen vacancy defect; Heterostructure; H-2; evolution; GRAPHITIC CARBON NITRIDE; CHARGE-TRANSFER; HETEROJUNCTION; G-C3N4; DEGRADATION; FABRICATION; COMPOSITE; NANOSHEETS; WATER; NANOPARTICLES;
D O I
10.1016/j.ijhydene.2021.05.098
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Formation of oxygen vacancy is emerging as one type of promising defect engineering in the preparation of inorganic functional composites. In this work, a novel composite upon the calcination of the nanosheets Bi6O6(OH)(3)(NO3)(3)center dot 1.5H(2)O (BBN) and g-C3N4 was prepared. A large amount of oxygen vacancies was revealed by electron spin resonance (ESR) and Raman spectroscopy. These intriguing structural characters render the as-prepared composite with excellent interfacial charge transfer and photo-stimulated response as shown by electrochemical impedance spectroscopy (EIS) and photocurrent measurement. Upon visible-light activation, such composite enables photocatalyse H-2 evolution with a rate of 181 mmol h(-1) g(-1) around the 4.2 times that of pure g-C3N4 as a reference. Such composite catalyst exhibits excellent recycling and reusable behaviors. The formation of BBN/CN heterojunction and the existence of oxygen vacancies are the main reasons for the distinctly improvement of its photocatalytic activity, which has been verified by theoretical calculations. (C) 2021 Hydrogen Energy Publications LLC. Published by Elsevier Ltd. All rights reserved.
引用
收藏
页码:25832 / 25842
页数:11
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