CuInS2 films were deposited by spray pyrolysis method at 250 degrees C and 350 degrees C using aqueous solutions of CuCl2, InCl3 and SC(NH2)(2) at molar ratio of precursors Cu:In:S=1:1:3 in spray solution. Films were characterized by X-ray diffraction (XRD), Raman and X-ray photoelectron spectroscopy (XPS) techniques. According to XPS, the films grown at 350 degrees C have Cu2+ containing pieces on the surface, the film composition in bulk region is not homogeneous and contains metal bonded oxygen in amount of 5-8 at.%. Deposition at 250 degrees C reduces the content of oxygen down to similar to 1 at. %, the films are low-crystalline with uniform distribution of the elements throughout the film and contain some excess of sulfur compared to stoichiometric CuInS2. (C) 2010 Published by Elsevier Ltd