共 60 条
Effects of N2/Ar flow ratio on the structures and mechanical behavior of ZrOxNy/V2O3 nano-multilayered films
被引:3
作者:

Cheng, Wenjie
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China

Li, Wei
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China

Wang, Jingjing
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China

Liu, Ping
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China

Ma, Xun
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China

Zhang, Ke
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China

Ma, Fengcang
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China

Chen, Xiaohong
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China

Liaw, Peter K.
论文数: 0 引用数: 0
h-index: 0
机构:
Univ Tennessee, Dept Mat Sci & Engn, Knoxville, TN 37996 USA Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China
机构:
[1] Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China
[2] Univ Tennessee, Dept Mat Sci & Engn, Knoxville, TN 37996 USA
来源:
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING
|
2022年
/
849卷
基金:
中国国家自然科学基金;
美国国家科学基金会;
关键词:
Nano-multilayered film;
Magnetron sputtering;
N-2;
Ar flow ratio;
Microstructure;
Strengthening and toughening;
THIN-FILMS;
ELECTRICAL-PROPERTIES;
TRIBOLOGICAL PROPERTIES;
MULTILAYER COATINGS;
FRACTURE-TOUGHNESS;
THERMAL-STABILITY;
CARBON-FILMS;
TRANSITION;
XPS;
TIN;
D O I:
10.1016/j.msea.2022.143419
中图分类号:
TB3 [工程材料学];
学科分类号:
0805 ;
080502 ;
摘要:
The ZrOxNy/V2O3 nano-multilayered films were prepared by magnetron sputtering, using a Zr metal target and VO2 powder metallurgy target at different N2/Ar flow ratios. The effects of N2/Ar flow ratios on the microstructures, fracture toughness, and hardness of the nano-multilayered films were analyzed. The experimental results showed that the phase structures of nano-multilayered films were composed of ZrO2, V2O3, and ZrN under the influence of the N2/Ar flow ratios. The hardness value of nano-multilayered films stabilized around 10.6 GPa. The maximum H3/E*2 and H/E* values were 0.054 GPa and 0.073, respectively, when the N2/Ar flow ratio was 20/30, and the fracture toughness value was 0.879 MPa m1/2, which was approximately equal to 2.15 times of the nano-multilayered film with the N2/Ar flow ratio of 5/30, showing relatively good toughness. The varying N2/Ar flow ratios led to the lattice distortion and grain refinement of ZrOxNy/V2O3 nano-multilayered films, which promoted the optimal mechanical properties of the nano-multilayered films.
引用
收藏
页数:9
相关论文
共 60 条
- [1] Relationship between structure, surface topography and tribo-mechanical behavior of Ti-N thin films elaborated at different N2 flow rates[J]. THIN SOLID FILMS, 2021, 724Aissani, Linda论文数: 0 引用数: 0 h-index: 0机构: Larbi Ben MHidi Univ, Lab Act Components & Mat, Oum El Bouaghi 04000, Algeria Abbes Laghrour Khenchela Univ, Phys Dept, PO 1252, El Hamma 40004, Khenchela, Algeria Larbi Ben MHidi Univ, Lab Act Components & Mat, Oum El Bouaghi 04000, AlgeriaAlhussein, Akram论文数: 0 引用数: 0 h-index: 0机构: Univ Technol Troyes, Pole Technol Sud Champagne, LASMIS, 26 Rue Lavoisier, F-52800 Nogent, France Larbi Ben MHidi Univ, Lab Act Components & Mat, Oum El Bouaghi 04000, AlgeriaAyad, Abdelhak论文数: 0 引用数: 0 h-index: 0机构: Univ Salah Boubnider Constantine 3 Nouvelle Ville, Fac Med, Dept Pharm, Constantine, Algeria Larbi Ben MHidi Univ, Lab Act Components & Mat, Oum El Bouaghi 04000, AlgeriaNouveau, Corinne论文数: 0 引用数: 0 h-index: 0机构: HESAM Univ, Arts & Metiers Inst Technol, LABOMAP, F-71250 Cluny, France Larbi Ben MHidi Univ, Lab Act Components & Mat, Oum El Bouaghi 04000, AlgeriaZgheib, Elia论文数: 0 引用数: 0 h-index: 0机构: Univ Technol Troyes, Pole Technol Sud Champagne, LASMIS, 26 Rue Lavoisier, F-52800 Nogent, France Larbi Ben MHidi Univ, Lab Act Components & Mat, Oum El Bouaghi 04000, AlgeriaBelgroune, Ahlam论文数: 0 引用数: 0 h-index: 0机构: Larbi Ben MHidi Univ, Lab Act Components & Mat, Oum El Bouaghi 04000, Algeria Univ Technol Troyes, Pole Technol Sud Champagne, LASMIS, 26 Rue Lavoisier, F-52800 Nogent, France Larbi Ben MHidi Univ, Lab Act Components & Mat, Oum El Bouaghi 04000, AlgeriaZaabat, Mourad论文数: 0 引用数: 0 h-index: 0机构: Larbi Ben MHidi Univ, Lab Act Components & Mat, Oum El Bouaghi 04000, Algeria Larbi Ben MHidi Univ, Lab Act Components & Mat, Oum El Bouaghi 04000, Algeria论文数: 引用数: h-index:机构:
- [2] Structures and mechanical properties of TiN/SiNx multilayer films deposited by magnetron sputtering at different N2/Ar gas flow ratios[J]. VACUUM, 2008, 82 (11) : 1187 - 1190An, T.论文数: 0 引用数: 0 h-index: 0机构: Jilin Univ, Dept Mat Sci, Key Lab Automobile Mat MOE, Changchun 130012, Peoples R ChinaTian, H. W.论文数: 0 引用数: 0 h-index: 0机构: Jilin Univ, Dept Mat Sci, Key Lab Automobile Mat MOE, Changchun 130012, Peoples R ChinaWen, M.论文数: 0 引用数: 0 h-index: 0机构: Jilin Univ, Dept Mat Sci, Key Lab Automobile Mat MOE, Changchun 130012, Peoples R ChinaZheng, W. T.论文数: 0 引用数: 0 h-index: 0机构: Jilin Univ, Dept Mat Sci, Key Lab Automobile Mat MOE, Changchun 130012, Peoples R China Jilin Univ, Dept Mat Sci, Key Lab Automobile Mat MOE, Changchun 130012, Peoples R China
- [3] Study of TiN and ZrN thin films grown by cathodic arc technique[J]. APPLIED SURFACE SCIENCE, 2006, 253 (04) : 1683 - 1690Arias, D. F.论文数: 0 引用数: 0 h-index: 0机构: Univ Nacl Colombia, Lab Fis Plasma, Bogota, Colombia Univ Nacl Colombia, Lab Fis Plasma, Bogota, ColombiaArango, Y. C.论文数: 0 引用数: 0 h-index: 0机构: Univ Nacl Colombia, Lab Fis Plasma, Bogota, Colombia Univ Nacl Colombia, Lab Fis Plasma, Bogota, ColombiaDevia, A.论文数: 0 引用数: 0 h-index: 0机构: Univ Nacl Colombia, Lab Fis Plasma, Bogota, Colombia Univ Nacl Colombia, Lab Fis Plasma, Bogota, Colombia
- [4] Valence-Band and Chemical-State Analyses of Zr and O in Thermally Grown Thin Zirconium-Oxide Films: An XPS Study[J]. JOURNAL OF PHYSICAL CHEMISTRY C, 2011, 115 (40) : 19841 - 19848Bakradze, Georgijs论文数: 0 引用数: 0 h-index: 0机构: Max Planck Inst Intelligent Syst, D-70569 Stuttgart, Germany Max Planck Inst Intelligent Syst, D-70569 Stuttgart, GermanyJeurgens, Lars P. H.论文数: 0 引用数: 0 h-index: 0机构: Max Planck Inst Intelligent Syst, D-70569 Stuttgart, Germany Max Planck Inst Intelligent Syst, D-70569 Stuttgart, GermanyMittemeijer, Eric J.论文数: 0 引用数: 0 h-index: 0机构: Max Planck Inst Intelligent Syst, D-70569 Stuttgart, Germany Univ Stuttgart, Inst Mat Sci, D-7000 Stuttgart, Germany Max Planck Inst Intelligent Syst, D-70569 Stuttgart, Germany
- [5] ENERGY AND ANGULAR-DISTRIBUTIONS OF SPUTTERED PARTICLES[J]. INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 1994, 140 : 1 - 110BETZ, G论文数: 0 引用数: 0 h-index: 0机构: TH DARMSTADT, INST KERNPHYS, D-64289 DARMSTADT, GERMANYWIEN, K论文数: 0 引用数: 0 h-index: 0机构: TH DARMSTADT, INST KERNPHYS, D-64289 DARMSTADT, GERMANY
- [6] Effects of nitrogen content on microstructures and mechanical properties of (AlCrTiZrHf)N high-entropy alloy nitride films[J]. JOURNAL OF ALLOYS AND COMPOUNDS, 2020, 834 (834)Cui, Panpan论文数: 0 引用数: 0 h-index: 0机构: Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R ChinaLi, Wei论文数: 0 引用数: 0 h-index: 0机构: Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R ChinaLiu, Ping论文数: 0 引用数: 0 h-index: 0机构: Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R ChinaZhang, Ke论文数: 0 引用数: 0 h-index: 0机构: Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R ChinaMa, Fengcang论文数: 0 引用数: 0 h-index: 0机构: Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R ChinaChen, Xiaohong论文数: 0 引用数: 0 h-index: 0机构: Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R ChinaFeng, Rui论文数: 0 引用数: 0 h-index: 0机构: Univ Tennessee, Dept Mat Sci & Engn, Knoxville, TN 37996 USA Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R ChinaLiaw, Peter K.论文数: 0 引用数: 0 h-index: 0机构: Univ Tennessee, Dept Mat Sci & Engn, Knoxville, TN 37996 USA Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China
- [7] Structure, mechanical and tribological properties of self -toughening TiSiN/Ag multilayer coatings on Ti6A14V prepared by arc ion plating[J]. APPLIED SURFACE SCIENCE, 2016, 386 : 224 - 233Dang, Chaoqun论文数: 0 引用数: 0 h-index: 0机构: Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China Chinese Acad Sci, Key Lab Marine Mat & Related Technol, Zhejiang Key Lab Marine Mat & Protect Technol, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R ChinaLi, Jinlong论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Marine Mat & Related Technol, Zhejiang Key Lab Marine Mat & Protect Technol, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R ChinaWang, Yue论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Marine Mat & Related Technol, Zhejiang Key Lab Marine Mat & Protect Technol, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R ChinaChen, Jianmin论文数: 0 引用数: 0 h-index: 0机构: Chinese Acad Sci, Key Lab Marine Mat & Related Technol, Zhejiang Key Lab Marine Mat & Protect Technol, Ningbo Inst Mat Technol & Engn, Ningbo 315201, Zhejiang, Peoples R China Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200072, Peoples R China
- [8] Al80Cr20N-layer thickness-dependent microstructure and mechanical properties of Al50Cr50N/Al80Cr20N nanomultilayered films[J]. VACUUM, 2019, 162 : 1 - 7Dua, Haoming论文数: 0 引用数: 0 h-index: 0机构: Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China Shanghai Dianji Univ, Sch Mat Sci & Engn, Shanghai 200240, Peoples R China Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R ChinaLiu, Ping论文数: 0 引用数: 0 h-index: 0机构: Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R ChinaLi, Wei论文数: 0 引用数: 0 h-index: 0机构: Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R ChinaZhang, Ke论文数: 0 引用数: 0 h-index: 0机构: Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R ChinaMa, Fengcang论文数: 0 引用数: 0 h-index: 0机构: Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R ChinaLiu, Xinkuan论文数: 0 引用数: 0 h-index: 0机构: Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R ChinaChen, Xiaohong论文数: 0 引用数: 0 h-index: 0机构: Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R ChinaHe, Daihua论文数: 0 引用数: 0 h-index: 0机构: Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China Univ Shanghai Sci & Technol, Sch Mat Sci & Engn, Shanghai 200093, Peoples R China
- [9] Self-organization during growth of ZrN/SiNx multilayers by epitaxial lateral overgrowth[J]. JOURNAL OF APPLIED PHYSICS, 2013, 114 (22)Fallqvist, A.论文数: 0 引用数: 0 h-index: 0机构: Linkoping Univ, Thin Film Phys Div, Dept Phys Chem & Biol IFM, SE-58183 Linkoping, Sweden Linkoping Univ, Thin Film Phys Div, Dept Phys Chem & Biol IFM, SE-58183 Linkoping, SwedenGhafoor, N.论文数: 0 引用数: 0 h-index: 0机构: Linkoping Univ, Dept Phys Chem & Biol IFM, SE-58183 Linkoping, Sweden Linkoping Univ, Thin Film Phys Div, Dept Phys Chem & Biol IFM, SE-58183 Linkoping, SwedenFager, H.论文数: 0 引用数: 0 h-index: 0机构: Linkoping Univ, Thin Film Phys Div, Dept Phys Chem & Biol IFM, SE-58183 Linkoping, Sweden Linkoping Univ, Thin Film Phys Div, Dept Phys Chem & Biol IFM, SE-58183 Linkoping, SwedenHultman, L.论文数: 0 引用数: 0 h-index: 0机构: Linkoping Univ, Thin Film Phys Div, Dept Phys Chem & Biol IFM, SE-58183 Linkoping, Sweden Linkoping Univ, Thin Film Phys Div, Dept Phys Chem & Biol IFM, SE-58183 Linkoping, SwedenPersson, P. O. A.论文数: 0 引用数: 0 h-index: 0机构: Linkoping Univ, Thin Film Phys Div, Dept Phys Chem & Biol IFM, SE-58183 Linkoping, Sweden Linkoping Univ, Thin Film Phys Div, Dept Phys Chem & Biol IFM, SE-58183 Linkoping, Sweden
- [10] Hot target magnetron sputtering enhanced by RF-ICP source for CrNx coatings deposition[J]. VACUUM, 2021, 191Grudinin, V. A.论文数: 0 引用数: 0 h-index: 0机构: Tomsk Polytech Univ, Tomsk 634050, Russia Tomsk Polytech Univ, Tomsk 634050, RussiaSidelev, D. V.论文数: 0 引用数: 0 h-index: 0机构: Tomsk Polytech Univ, Tomsk 634050, Russia Tomsk Polytech Univ, Tomsk 634050, RussiaBleykher, G. A.论文数: 0 引用数: 0 h-index: 0机构: Tomsk Polytech Univ, Tomsk 634050, Russia Tomsk Polytech Univ, Tomsk 634050, RussiaYuriev, YuN.论文数: 0 引用数: 0 h-index: 0机构: Tomsk Polytech Univ, Tomsk 634050, Russia Tomsk Polytech Univ, Tomsk 634050, RussiaKrivobokov, V. P.论文数: 0 引用数: 0 h-index: 0机构: Tomsk Polytech Univ, Tomsk 634050, Russia Tomsk Polytech Univ, Tomsk 634050, RussiaBerlin, E. V.论文数: 0 引用数: 0 h-index: 0机构: Lab Vacuum Technol Plus LLC, Moscow 124460, Russia Tomsk Polytech Univ, Tomsk 634050, RussiaGrigoriev, V. Yu论文数: 0 引用数: 0 h-index: 0机构: Lab Vacuum Technol Plus LLC, Moscow 124460, Russia Tomsk Polytech Univ, Tomsk 634050, RussiaObrosov, A.论文数: 0 引用数: 0 h-index: 0机构: Brandenburg Tech Univ Cottbus, D-03046 Cottbus, Germany Tomsk Polytech Univ, Tomsk 634050, Russia论文数: 引用数: h-index:机构: