Effects of N2/Ar flow ratio on the structures and mechanical behavior of ZrOxNy/V2O3 nano-multilayered films

被引:4
作者
Cheng, Wenjie [1 ]
Li, Wei [1 ]
Wang, Jingjing [1 ]
Liu, Ping [1 ]
Ma, Xun [1 ]
Zhang, Ke [1 ]
Ma, Fengcang [1 ]
Chen, Xiaohong [1 ]
Liaw, Peter K. [2 ]
机构
[1] Univ Shanghai Sci & Technol, Sch Mat & Chem, Shanghai 200093, Peoples R China
[2] Univ Tennessee, Dept Mat Sci & Engn, Knoxville, TN 37996 USA
来源
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 2022年 / 849卷
基金
美国国家科学基金会; 中国国家自然科学基金;
关键词
Nano-multilayered film; Magnetron sputtering; N-2; Ar flow ratio; Microstructure; Strengthening and toughening; THIN-FILMS; ELECTRICAL-PROPERTIES; TRIBOLOGICAL PROPERTIES; MULTILAYER COATINGS; FRACTURE-TOUGHNESS; THERMAL-STABILITY; CARBON-FILMS; TRANSITION; XPS; TIN;
D O I
10.1016/j.msea.2022.143419
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The ZrOxNy/V2O3 nano-multilayered films were prepared by magnetron sputtering, using a Zr metal target and VO2 powder metallurgy target at different N2/Ar flow ratios. The effects of N2/Ar flow ratios on the microstructures, fracture toughness, and hardness of the nano-multilayered films were analyzed. The experimental results showed that the phase structures of nano-multilayered films were composed of ZrO2, V2O3, and ZrN under the influence of the N2/Ar flow ratios. The hardness value of nano-multilayered films stabilized around 10.6 GPa. The maximum H3/E*2 and H/E* values were 0.054 GPa and 0.073, respectively, when the N2/Ar flow ratio was 20/30, and the fracture toughness value was 0.879 MPa m1/2, which was approximately equal to 2.15 times of the nano-multilayered film with the N2/Ar flow ratio of 5/30, showing relatively good toughness. The varying N2/Ar flow ratios led to the lattice distortion and grain refinement of ZrOxNy/V2O3 nano-multilayered films, which promoted the optimal mechanical properties of the nano-multilayered films.
引用
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页数:9
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共 60 条
[1]   Relationship between structure, surface topography and tribo-mechanical behavior of Ti-N thin films elaborated at different N2 flow rates [J].
Aissani, Linda ;
Alhussein, Akram ;
Ayad, Abdelhak ;
Nouveau, Corinne ;
Zgheib, Elia ;
Belgroune, Ahlam ;
Zaabat, Mourad ;
Barille, Regis .
THIN SOLID FILMS, 2021, 724
[2]   Structures and mechanical properties of TiN/SiNx multilayer films deposited by magnetron sputtering at different N2/Ar gas flow ratios [J].
An, T. ;
Tian, H. W. ;
Wen, M. ;
Zheng, W. T. .
VACUUM, 2008, 82 (11) :1187-1190
[3]   Study of TiN and ZrN thin films grown by cathodic arc technique [J].
Arias, D. F. ;
Arango, Y. C. ;
Devia, A. .
APPLIED SURFACE SCIENCE, 2006, 253 (04) :1683-1690
[4]   Valence-Band and Chemical-State Analyses of Zr and O in Thermally Grown Thin Zirconium-Oxide Films: An XPS Study [J].
Bakradze, Georgijs ;
Jeurgens, Lars P. H. ;
Mittemeijer, Eric J. .
JOURNAL OF PHYSICAL CHEMISTRY C, 2011, 115 (40) :19841-19848
[5]   ENERGY AND ANGULAR-DISTRIBUTIONS OF SPUTTERED PARTICLES [J].
BETZ, G ;
WIEN, K .
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 1994, 140 :1-110
[6]   Effects of nitrogen content on microstructures and mechanical properties of (AlCrTiZrHf)N high-entropy alloy nitride films [J].
Cui, Panpan ;
Li, Wei ;
Liu, Ping ;
Zhang, Ke ;
Ma, Fengcang ;
Chen, Xiaohong ;
Feng, Rui ;
Liaw, Peter K. .
JOURNAL OF ALLOYS AND COMPOUNDS, 2020, 834
[7]   Structure, mechanical and tribological properties of self -toughening TiSiN/Ag multilayer coatings on Ti6A14V prepared by arc ion plating [J].
Dang, Chaoqun ;
Li, Jinlong ;
Wang, Yue ;
Chen, Jianmin .
APPLIED SURFACE SCIENCE, 2016, 386 :224-233
[8]   Al80Cr20N-layer thickness-dependent microstructure and mechanical properties of Al50Cr50N/Al80Cr20N nanomultilayered films [J].
Dua, Haoming ;
Liu, Ping ;
Li, Wei ;
Zhang, Ke ;
Ma, Fengcang ;
Liu, Xinkuan ;
Chen, Xiaohong ;
He, Daihua .
VACUUM, 2019, 162 :1-7
[9]   Self-organization during growth of ZrN/SiNx multilayers by epitaxial lateral overgrowth [J].
Fallqvist, A. ;
Ghafoor, N. ;
Fager, H. ;
Hultman, L. ;
Persson, P. O. A. .
JOURNAL OF APPLIED PHYSICS, 2013, 114 (22)
[10]   Hot target magnetron sputtering enhanced by RF-ICP source for CrNx coatings deposition [J].
Grudinin, V. A. ;
Sidelev, D. V. ;
Bleykher, G. A. ;
Yuriev, YuN. ;
Krivobokov, V. P. ;
Berlin, E. V. ;
Grigoriev, V. Yu ;
Obrosov, A. ;
Weiss, S. .
VACUUM, 2021, 191