Cyclotron resonance for 2D electrons on helium films above rough substrates

被引：0

作者：

Würl, A

Klier, J ^{[1
]}

Leiderer, P

Shikin, V

机构：

[1] Univ Konstanz, Dept Phys, D-78457 Constance, Germany

[2] ISSP, Chernogolovka 142432, Moscow Dist, Russia

来源：

PHYSICA E-LOW-DIMENSIONAL SYSTEMS & NANOSTRUCTURES | 2003年 / 18卷 / 1-3期

关键词：

2D electron systems; cyclotron resonance; thin helium films; surface roughness;

D O I：

10.1016/S1386-9477(02)01087-1

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

An investigation of the microwave absorption for two-dimensional electron systems (2DES) on helium films and in the presence of a cyclotron resonance (CR) magnetic field are presented. Measured data are explained by a recently proposed two-fraction model of the 2DES, which makes the general structure of the microwave absorption understandable. The fraction of localized and free electrons can be precisely determined and its dependence on the thickness of the helium film above the roughness of the underlying solid substrate is understood. (C) 2003 Elsevier Science B.V. All rights reserved.

引用

页码：184 / 185

页数：2