Laser cleaning of particles from silicon wafers: capabilities and mechanisms

被引：4

作者：

Graf, J ^{[1
]}

Lang, F ^{[1
]}

Mosbacher, M ^{[1
]}

Leiderer, P ^{[1
]}

机构：

[1] Univ Konstanz, Dept Phys, D-78457 Constance, Germany

来源：

ULTRA CLEAN PROCESSING OF SILICON SURFACES VII | 2005年 / 103-104卷

关键词：

particle removal; laser cleaning; dry laser cleaning; steam laser cleaning;

D O I：

10.4028/www.scientific.net/SSP.103-104.185

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：185 / 188

页数：4

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