High performance tunnel field effect transistors based on in-plane transition metal dichalcogenide heterojunctions

被引:21
作者
Choukroun, Jean [1 ]
Pala, Marco [1 ]
Fang, Shiang [2 ]
Kaxiras, Efthimios [2 ,3 ]
Dollfus, Philippe [1 ]
机构
[1] Univ Paris Saclay, Univ Paris Sud, Ctr Nanosci & Nanotechnol, CNRS, Orsay, France
[2] Harvard Univ, Dept Phys, Cambridge, MA 02138 USA
[3] Harvard Univ, John A Paulson Sch Engn & Appl Sci, Cambridge, MA 02138 USA
关键词
TFET; transition metal dichalcogenides; steep-slope; NEGF; tight-binding; quantum simulation; MoS2; INDUCED VARIABILITY; INTERFACE TRAPS; BORON-NITRIDE; 2D MATERIALS; HETEROSTRUCTURES; FETS; MONOLAYER; GRAPHENE; SINGLE;
D O I
10.1088/1361-6528/aae7df
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In-plane heterojunction tunnel field effect transistors based on monolayer transition metal dichalcogenides are studied by means of self-consistent non-equilibrium Green's functions simulations and an atomistic tight-binding Hamiltonian. We start by comparing several heterojunctions before focusing on the most promising ones, i.e. WTe2-MoS2 and MoTe2-MoS2. The scalability of those devices as a function of channel length is studied, and the influence of backgate voltages on device performance is analyzed. Our results indicate that, by fine-tuning the design parameters, those devices can yield extremely low subthreshold swings (<5 mV/decade) and I-ON/I-OFF ratios higher than 10(8) at a supply voltage of 0.3 V, making them ideal for ultra-low power consumption.
引用
收藏
页数:11
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