Oxygen plasma treatment of HKUST-1 for porosity retention upon exposure to moisture

被引：32

作者：

Bae, Jaeyeon ^{[1
]}

Jung, Jin-Woo ^{[1
]}

Park, Hyo Yul ^{[2
]}

Cho, Chang-Hee ^{[1
]}

Park, Jinhee ^{[1
]}

机构：

[1] Daegu Gyeongbuk Inst Sci & Technol, Dept Emerging Mat Sci, Daegu 42988, South Korea

[2] Korea Elect Res Inst, Creat & Fundamental Res Div, Chang Won 51543, South Korea

来源：

CHEMICAL COMMUNICATIONS | 2017年 / 53卷 / 89期

基金：

新加坡国家研究基金会;

关键词：

METAL-ORGANIC FRAMEWORKS; ROOM-TEMPERATURE; CARBON-DIOXIDE; ACTIVATION; ADSORPTION; STABILITY; WATER; RESISTANT; CAPTURE; STORAGE;

D O I：

10.1039/c7cc05845d

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Despite their remarkable properties, metal-organic frameworks (MOFs) present vulnerable structures that are sensitive to moisture; therefore, their application to real field situations is challenging. Herein, an O-2 plasma technique was introduced as a new method for the activation and protection of porosity in HKUST-1. In an unprecedented manner, O-2 plasma-treated HKUST-1 retains its porosity after a long exposure to moisture as compared to pristine HKUST-1. Porosity retention was examined by N-2 adsorption/desorption measurements of non-activated HKUST-1 after exposure to moisture.

引用

页码：12100 / 12103

页数：4

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