There is an urgent technical requirement of lowering the sintering temperature of Y3Fe5O12 (YIG) for its practical applications. In this paper, a modified solid state reaction method is reported by adding the surfactant of cetyltrimethylammonium bromide (CTAB). A high sintering temperature of 1200 degrees C is required for the formation of YIG phase without adding CTAB, which is effectively decreased to 1050 degrees C by adding CTAB. The morphology studies show that the sintering temperature plays the main role in the crystal growth and excludes the possible contribution of CTAB. The prepared YIG ceramic samples show soft ferromagnetic properties, with coercivity of only 21.2 Oe for the sample prepared with CTAB at 1050 degrees C, which decreases with increasing sintering temperature. The main role of adding CTAB is preventing the agglomeration of ball milled ultrafine source particles, which may facilitate the interdiffusion among them and promote the reaction at lower temperatures. Furthermore, the Gilbert damping constant is significantly reduced for YIG prepared by adding CTAB, which is one order smaller than that without CTAB. (C) 2017 Elsevier B.V. All rights reserved.
机构:
Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R ChinaColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Liu, Tao
;
Chang, Houchen
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Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USAColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Chang, Houchen
;
Vlaminck, Vincent
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Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USAColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Vlaminck, Vincent
;
Sun, Yiyan
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Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USAColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Sun, Yiyan
;
Kabatek, Michael
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Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USAColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Kabatek, Michael
;
Hoffmann, Axel
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Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USAColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Hoffmann, Axel
;
Deng, Longjiang
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Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R ChinaColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Deng, Longjiang
;
Wu, Mingzhong
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Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USAColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
机构:
Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R ChinaColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Liu, Tao
;
Chang, Houchen
论文数: 0引用数: 0
h-index: 0
机构:
Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USAColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Chang, Houchen
;
Vlaminck, Vincent
论文数: 0引用数: 0
h-index: 0
机构:
Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USAColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Vlaminck, Vincent
;
Sun, Yiyan
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h-index: 0
机构:
Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USAColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Sun, Yiyan
;
Kabatek, Michael
论文数: 0引用数: 0
h-index: 0
机构:
Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USAColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Kabatek, Michael
;
Hoffmann, Axel
论文数: 0引用数: 0
h-index: 0
机构:
Argonne Natl Lab, Div Mat Sci, Argonne, IL 60439 USAColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Hoffmann, Axel
;
Deng, Longjiang
论文数: 0引用数: 0
h-index: 0
机构:
Univ Elect Sci & Technol China, State Key Lab Elect Thin Films & Integrated Devic, Chengdu 610054, Peoples R ChinaColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA
Deng, Longjiang
;
Wu, Mingzhong
论文数: 0引用数: 0
h-index: 0
机构:
Colorado State Univ, Dept Phys, Ft Collins, CO 80523 USAColorado State Univ, Dept Phys, Ft Collins, CO 80523 USA