Magnetic behavior of Ni+ implanted silica

被引：22

作者：

Cíntora-González, O

Estournès, C

Muller, D

Guille, J

Grob, JJ

机构：

[1] IPCMS, GMI, CNRS, UMR 75040, F-67037 Strasbourg, France

[2] Lab PHASE, CNRS, UPR 292, F-67037 Strasbourg, France

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1999年 / 147卷 / 1-4期

关键词：

implantation; magnetization; nickel; nanoparticles; UV-visible;

D O I：

10.1016/S0168-583X(98)00579-5

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Ni+ has been implanted in amorphous silica layers and silica glasses at two dose levels (10(16) and 10(17) Ni+ cm(-2)) and two different energies (30 and 160 keV). Superparamagnetic and ferromagnetic behaviors were observed with a SQUID magnetometer at RT and 5 K, respectively. Using Langevin's theory, the size of the metallic nanoparticles were deduced to ranges between 2 and 6.5 nm in good agreement of HRTEM observations. The E' type center and the neutral oxygen vacancy (NOV) defects were observed by UV-Vis absorption. Finally, in samples annealed at 600 degrees C under Ar or Ar+H-2 atmospheres two different phenomena were observed: the reduction of Ni2+ to Ni-0 and the elimination of defects introduced by implantation. (C) 1999 Elsevier Science B.V. All rights reserved.

引用

页码：422 / 426

页数：5

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