Structure and tribological behaviors of synthetic MoS2 film prepared by a novel compound method

被引：2
作者：
Zhu Li-na [1 ,2 ]
Wang Cheng-biao [1 ]
Wang Hai-dou [2 ]
Xu Bin-shi [2 ]
Liu Jia-jun [3 ]
Li Guo-lu [4 ]
机构：
[1] China Univ Geosci, Sch Engn & Technol, Beijing 100083, Peoples R China
[2] Acad Armored Forces Engn, Natl Key Lab Remfg, Beijing 100072, Peoples R China
[3] Tsinghua Univ, Dept Mech Engn, Beijing 100084, Peoples R China
[4] Hebei Univ Technol, Sch Mat Sci & Engn, Tianjin 300130, Peoples R China
来源：
HIGH PERFORMANCE STRUCTURES AND MATERIALS ENGINEERING, PTS 1 AND 2 | 2011年 / 217-218卷
关键词：
magnetron sputtering; low temperature ion sulfurizing; synthetic MoS2 film; structure; tribological behavior; LIQUID PARAFFIN; LAYER;
D O I：
10.4028/www.scientific.net/AMR.217-218.1102
中图分类号：
TH [机械、仪表工业];
学科分类号：
0802 ;
摘要：
In this paper, the structure and tribological properties of synthetic MoS2 film prepared by a novel compound technology-combining magnetron sputtering with low temperature ion sulfurizing were investigated. X-ray diffraction (XRD) pattern for the MoS2 film implies that the film mainly consists of Mo and MoS2 phases. The hardness of the synthetic MoS2 film was 7.44 GPa which was higher than that of the FeS film. The sliding tribological behavior of the MoS2 film was studied by ball-on-disc tests. The results showed that the synthetic MoS2 film possessed excellent friction-reducing and wear-resisting properties. In addition, the tribological behaviors of the MoS2 film were superior to those of the FeS film and original 1045 steel.
引用
收藏
页码：1102 / +
页数：2
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