Cubic III-nitrides: potential photonic materials

被引:0
作者
Onabe, K. [1 ]
Sanorpim, S. [2 ]
Kato, H.
Kakuda, M.
Nakamura, T.
Nakamura, K.
Kuboya, S.
Katayama, R. [3 ]
机构
[1] Univ Tokyo, Dept Adv Mat Sci, 5-1-5 Kashiwanoha, Chiba 2778561, Japan
[2] Chulalongkorn Univ, Dept Phys, Bangkok 10330, Thailand
[3] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 980, Japan
来源
QUANTUM SENSING AND NANOPHOTONIC DEVICES VIII | 2011年 / 7945卷
关键词
cubic III-nitride; GaN; InN; AlN; MOVPE; RF-MBE; RF-MBE GROWTH; INN FILMS; STRUCTURAL-CHARACTERIZATION; GAN GROWTH;
D O I
10.1117/12.865768
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The growth and characterization of some cubic III-nitride films on suitable cubic substrates have been done, namely, c-GaN on GaAs by MOVPE, c-GaN and c-AlGaN on MgO by RF-MBE, and c-InN and c-InGaN (In-rich) on YSZ by RF-MBE. This series of study has been much focused on the cubic-phase purity as dependent on the respective growth conditions and resulting electrical and optical properties. For c-GaN and c-InN films, a cubic-phase purity higher than 95% is attained in spite of the metastable nature of the cubic III-nitrides. However, for c-AlGaN and c-InGaN films, the cubic-phase purity is rapidly degraded with significant incorporation of the hexagonal phase through stacking faults on cubic {111} faces which may be exposed on the roughened growing or substrate surface. It has been shown that the electron mobilities in c-GaN and c-AlGaN films are much related to phase purity.
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页数:8
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