Extraction of Dynamic Threshold Voltage in Resistive Load Hard Switching Operation of Schottky-Type p-GaN Gate HEMT

被引:16
|
作者
Hwang, Injun [1 ]
Oh, Jaejoon [1 ]
Hwang, Sun-Kyu [1 ]
Kim, Boram [1 ]
Park, Jun Hyuk [1 ]
Kim, Joonyong [1 ]
Kim, Jongseob [1 ]
机构
[1] Samsung Elect Co Ltd, Samsung Adv Inst Technol, Suwon 16678, South Korea
关键词
Logic gates; Switches; Voltage measurement; Current measurement; Probes; HEMTs; Transient analysis; Dynamic threshold voltage; gallium nitride (GaN); high-electron mobility transistor (HEMT); p-GaN gate HEMT; Schottky gate; INSTABILITY; IMPACT; METAL;
D O I
10.1109/LED.2022.3200027
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Threshold voltage (VTh) drift of Schottky-type p-GaN gate high-electron mobility transistor (HEMT) was analyzed under high-voltage and hard switching conditions with a resistive load (R-Load). To overcome the distortion in the drain current (ID) - gate voltage (VG) curve caused by the internal drain capacitance (IDisp) charging current during the switching transients, a method is presented to accurately measure dynamic VTh through appropriate correction of IDisp. The dynamic variation of VTh was tracked with a gate-drive rise/fall times of 200 ns. During the switching operation, VTh increases rapidly at the beginning and then saturates at a stable value. This is attributed to the gate forward current during turn-on that increases the hole depletion of the p-GaN gate through the AlGaN barrier. The dynamic VTh increases linearly at a rate of 40% with the increase of gate turn-on voltage. VTh is independent of duty cycle but minorly increases with frequency at high voltages, suggesting that channel hot electrons be injected into the AlGaN barrier and p-GaN.
引用
收藏
页码:1720 / 1723
页数:4
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