Effects of surface corrugation on the molecular rotational dependence of H2 dissociative adsorption dynamics on Cu(100)

被引:13
作者
Miura, Y
Kasai, H
Diña, WG
Okiji, A
机构
[1] Osaka Univ, Dept Appl Phys, Suita, Osaka 5650871, Japan
[2] Wakayama Natl Coll Technol, Wakayama 6440023, Japan
基金
日本学术振兴会;
关键词
models of surface chemical reactions; molecular dynamics; molecular rotation; surface corrugation; copper; hydrogen;
D O I
10.1016/S0169-4332(00)00639-5
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We investigate and discuss how surface corrugation affects the molecular rotational dependence of H-2 dissociative adsorption dynamics on Cu(100) by performing six-dimensional (6D) quantum dynamics calculations. We calculate the dissociative adsorption probability as a function of the initial rotational state J and the normal energy E-norm of incident molecules,and compare with the dissociative adsorption results obtained by four-dimensional (4D) quantum dynamics calculations where the surface is treated as flat. In our calculation, for the case of normal incidence, the increase in dissociative adsorption probability with increasing E-norm and the non-monotonic behavior of dissociative adsorption probability with respect to J are suppressed on a corrugated surface as compared to that on a flat surface. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:30 / 35
页数:6
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