Bond breaking and temporary anion states in uracil and halouracils: Implications for the DNA bases

被引:183
作者
Scheer, AM [1 ]
Aflatooni, K
Gallup, GA
Burrow, PD
机构
[1] Univ Nebraska, Dept Phys & Astron, Lincoln, NE 68588 USA
[2] Ft Hays State Univ, Dept Phys, Hays, KS 67601 USA
关键词
D O I
10.1103/PhysRevLett.92.068102
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Low energy electrons are capable of breaking bonds in gas phase DNA bases by means of the dissociative electron attachment process. With the aid of new total scattering data in the halouracils and input from quantum chemical calculations, we describe the dipole bound and valence anion states in these compounds and present assignments for the two types of structure appearing in the cross sections. A clear distinction between the two mechanisms for bond breaking is necessary for an understanding of electron induced damage to DNA.
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页数:4
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