Effect of self assembly on the nonlinear optical characteristics of ZnO thin films

被引:57
作者
Irimpan, Litty [1 ]
Deepthy, A. [2 ]
Krishnan, Bindu [3 ]
Kukreja, L. M. [4 ]
Nampoori, V. P. N. [1 ]
Radhakrishnan, P. [1 ]
机构
[1] Cochin Univ Sci & Technol, Int Sch Photon, Cochin 682022, Kerala, India
[2] Amrita Inst Med Sci, Cochin, Kerala, India
[3] Ctr Mat Elect Technol, Trichur, India
[4] Ctr Adv Technol, Indore, Madhya Pradesh, India
关键词
Nonlinear optics - Photons - Self assembly - Sol-gel process - Zinc oxide;
D O I
10.1016/j.optcom.2008.01.029
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In the present work, we report the third order nonlinear optical properties of ZnO thin films deposited using self assembly, sol gel process as well as pulsed laser ablation by z scan technique. ZnO thin films clearly exhibit a negative nonlinear index of refraction at 532 nm and the observed nonlinear refraction is attributed to two photon absorption followed by free carrier absorption. Although the absolute nonlinear values for these films are comparable, there is a change in the sign of the absorptive nonlinearity of the films. The films developed by dip coating and pulsed laser ablation exhibit reverse saturable absorption whereas the self assembled film exhibits saturable absorption. These different nonlinear characteristics in the self assembled films can be mainly attributed to the saturation of linear absorption of the ZnO defect states. (c) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:2938 / 2943
页数:6
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