Structural characterization of defects in EFG- and HYPE-grown β-Ga2O3 crystals

This paper reviews the status of characterization of defects in beta-Ga2O3 crystals grown by edge-defined film-fed growth and hydride vapor phase epitaxy using chemical etching, scanning electron microscopy, focused ion beam scanning ion microscopy, X-ray topography (XRT), and transmission electron microscopy (TEM). The observed defects are classified into four types: dislocations, stacking faults (SFs), twins, and plate-like nanovoids (PNVs). First, we present the detailed characterization of dislocations in the crystal by chemical etching, XRT, and TEM, and discuss possible slip systems. Next, we describe XRT analyses of two types of SFs: SFs 1 lying on the ((2) over bar 01) plane and SFs 2 on the (111) and (1 (1) over bar1) planes. We describe the results for twins found in crystals via high-resolution TEM and electron diffraction analysis, and PNVs corresponding to etch pits on the (010) plane. Finally, we discuss possible generation mechanisms of the defects and their influence on device characteristics. (C) 2022 The Japan Society of Applied Physics