New n-type TiO2 transparent active channel TFTs fabricated with a solution process

被引:27
作者
Park, Jae-Woo [1 ]
Yoo, Seunghyup [1 ]
机构
[1] Korea Adv Inst Sci & Technol, Sch Elect Engn & Comp Sci, Taejon 305701, South Korea
关键词
dielectric films; field-effect transistors (FETs); metal-oxide-semiconductors; thin-film transistor (TFT); titanium dioxide (TiO2); transparent TFTs;
D O I
10.1109/LED.2008.2000608
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
New metal-oxide thin-film transistors (MOxTFTs) with a solution-processed TiO2 transparent active channel are fabricated with a novel doping process that consists of a deposition of an ultrathin Ti layer on TiO2 films and a brief rapid thermal annealing. Contrary to an as-prepared device which does not show any appreciable TFT actions, devices with the proposed process exhibit a clear n-type TFT behavior with a saturation mobility of 0.12 cm(2) . V-1 . s(-1) and a threshold voltage of 11 V. A solution processibility and a low-cost manufacturability of TiO2 make the presented TFTs potentially attractive for cost-sensitive applications.
引用
收藏
页码:724 / 727
页数:4
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