Optical Properties of TiO2 Films Deposited by Reactive Electron Beam Sputtering

被引：44

作者：

Kruchinin, V. N. ^{[1
]}

Perevalov, T. V. ^{[2
]}

Atuchin, V. V. ^{[1
,2
,3
,4
,5
]}

Gritsenko, V. A. ^{[1
,2
]}

Komonov, A. I. ^{[1
]}

Korolkov, I. V. ^{[2
,6
]}

Pokrovsky, L. D. ^{[1
]}

Shih, Cheng Wei ^{[7
]}

Chin, Albert ^{[7
]}

机构：

[1] Rzhanov Inst Semicond Phys, Novosibirsk 630090, Russia

[2] Novosibirsk State Univ, Novosibirsk 630090, Russia

[3] Tomsk State Univ, Funct Elect Lab, Tomsk 634050, Russia

[4] Tyumen State Univ, Inst Chem, Tyumen 625003, Russia

[5] South Ural State Univ, Lab Single Crystal Growth, Chelyabinsk 454080, Russia

[6] SB RAS, Nikolaev Inst Inorgan Chem, Lab Crystal Chem, Novosibirsk 630090, Russia

[7] Natl Chiao Tung Univ, Hsinchu 300, Taiwan

来源：

JOURNAL OF ELECTRONIC MATERIALS | 2017年 / 46卷 / 10期

基金：

俄罗斯科学基金会;

关键词：

TiO2; film; RHEED; AFM; spectroscopic ellipsometry; optical constant; TITANIUM-DIOXIDE; THIN-FILMS; THERMAL-OXIDATION; RUTILE; ANATASE; SURFACE; ABSORPTION; CONDUCTION; EVOLUTION;

D O I：

10.1007/s11664-017-5552-3

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Titanium dioxide (anatase, a-TiO2) films have been prepared by electron beam sputtering of a TiO2 target in reactive atmosphere and their structural, microstructural, and optical properties were evaluated by reflection high- energy electron diffraction (RHEED) and x-ray diffraction (XRD) analyses, atomic force microscopy (AFM), and spectroscopic ellipsometry (SE). Different reflection models for determination of film optical parameters were tested and compared. The dispersive optical parameters were defined using the Tauc-Lorentz model by SE in the photon energy range of E = 1.12-4.96 eV. The films were transparent at E < 3 eV, but noticeable absorption was detected at E > 3 eV. The bandgap was estimated at the level of E (g) ae 3.44 eV.

引用

页码：6089 / 6095

页数：7

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