Effect of polyvinyl butyral on the microstructure and laser damage threshold of antireflective silica films

被引：25

作者：

Chi, Fangting ^{[1
,2
]}

Yan, Lianghong ^{[1
]}

Lv, Haibing ^{[1
]}

Wang, Chengcheng ^{[1
]}

Yuan, Xiaodong ^{[1
]}

机构：

[1] China Acad Engn Phys, Res Ctr Laser Fus, Mianyang 621900, Peoples R China

[2] Sichuan Univ, Coll Chem, Chengdu 610064, Peoples R China

来源：

THIN SOLID FILMS | 2011年 / 519卷 / 08期

关键词：

Polyvinyl Butyral; Antireflective coatings; Silica; Sol-gel deposition; Laser induced damage threshold; Atomic Force Microscopy; CHEMISTRY;

D O I：

10.1016/j.tsf.2010.11.023

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Silica antireflective films modified by polyvinyl butyral (PVB) were deposited on fused silica substrates by sot gel process. The effects of PVB on the microstructure and laser damage threshold (LIDT) of films were investigated. The results of the nano particle analyzer and scanning probe microscope revealed that PVB molecules surrounded silica particles and controlled the particle growth, which resulted in a stable sot with uniformly distributed silica particles. Therefore, the films deposited from these modified sols possessed more uniform microstructures than the films without PVB. The adhesive-resistance test indicated that the strength of the modified silica films increased due to the bond reaction between PVB molecules and silica particles. The introduction of PVB into silica sols had also increased the LIDT of films. The LIDT of films increased from 30.0 J/cm(2) to 40.1 J/cm(2) after 1.0 wt.% PVB was added. The increase in LIDT was attributed to the increased strength and uniform microstructures of films as an effect of the PVB modification. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：2483 / 2487

页数：5

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