Development of an ion and electron dual focused beam apparatus for three-dimensional microanalysis

We are developing a novel three-dimensional (3D) microanalysis method by means of successive cross-sectional Auger mapping. In this method, a 3D elemental mao will be obtained by repetition of the cross-sectioning of a sample using a gallium focused ion beam (Ga FIB) and Auger mapping of the cross section using an electronic beam (EB). On the basis of this concept, an ion and electron dual focused beam apparatus was developed by combining a Ga FIB and a mass spectrometer with a scanning Auger microprobe. In this paper, we describe the concept and instrumentation of the dual focused beam apparatus. Two types of preliminary experiments: i) successive cross-sectioning of a microparticles (6.8 mu m phi) and ii) successive cross-sectional sample current imaging of a bonding ire of an IC, demonstrated the capability to create that analytical surfaces favorable for the 3D analysis with arbitrary shape and heterogeneity.