Contact Engineering of Molybdenum Ditelluride Field Effect Transistors through Rapid Thermal Annealing

被引:41
作者
Chen, Jiancui [1 ,2 ]
Feng, Zhihong [1 ,2 ]
Fan, Shuangqing [1 ,2 ]
Shi, Siang [1 ,2 ]
Yue, Yuchen [3 ]
Shen, Wanfu [2 ]
Xie, Yuan [1 ,2 ]
Wu, Enxiu [1 ,2 ]
Sun, Chongling [1 ]
Liu, Jing [1 ,2 ]
Zhang, Hao [1 ]
Pang, Wei [1 ]
Sun, Dong [4 ]
Feng, Wei [3 ]
Feng, Yiyu [3 ]
Wu, Sen [2 ]
Zhang, Daihua [1 ,2 ]
机构
[1] Tianjin Univ, State Key Lab Precis Measuring Technol & Instrume, Tianjin 300072, Peoples R China
[2] Tianjin Univ, Coll Precis Instrument & Optoelect Engn, Tianjin 300072, Peoples R China
[3] Tianjin Univ, Sch Mat Sci & Engn, Tianjin 300072, Peoples R China
[4] Peking Univ, Sch Phys, Int Ctr Quantum Mat, Beijing 100871, Peoples R China
关键词
MoTe2; polarity control; rapid thermal annealing; anti-site defects; transport; TMDCs; PHOTOCURRENT GENERATION; ANTISITE DEFECTS; METAL CONTACTS; HETEROSTRUCTURES; PERFORMANCE; TRANSITION; RESISTANCE;
D O I
10.1021/acsami.7b06739
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Understanding and engineering the interface between metal and two-dimensional materials are of great importance to the research and development of nano electronics. In many cases the interface of metal and 2D materials can dominate the transport behavior of the devices. In this study, we focus on the metal contacts of MoTe2 (molybdenum ditelluride) FETs (field effect transistors) and demonstrate how to use post-annealing treatment to modulate their transport behaviors in a-controlled manner. We have also carried out low temperature and transmission electron microscopy studies to understand the mechanisms behind the prominent effect of the annealing process. Changes in transport properties are presumably due to anti-site defects formed at the metal-MoTe2 interface under elevated temperature. The study provides more insights into MoTe2 field effect devices and suggests guidelines for future optimizations.
引用
收藏
页码:30107 / 30114
页数:8
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