High-Brightness Plasmon-Enhanced Nanostructured Gold Photoemitter

被引：11

作者：

Gong, Y. ^{[1
]}

Joly, Alan G. ^{[1
]}

Kong, L. M. ^{[1
]}

El-Khoury, Patrick Z. ^{[1
]}

Hess, Wayne P. ^{[1
]}

机构：

[1] Pacific NW Natl Lab, Div Phys Sci, Richland, WA 99352 USA

来源：

PHYSICAL REVIEW APPLIED | 2014年 / 2卷 / 06期

关键词：

HOLOGRAPHIC LITHOGRAPHY; FEMTOSECOND MICROSCOPY; SURFACE-PLASMONS; LASER; PHOTOEMISSION; FABRICATION; POLARITONS; EMISSION; PARTICLE; METALS;

D O I：

10.1103/PhysRevApplied.2.064012

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We fabricate plasmonic nanohole arrays in gold thin films by focused-ion-beam lithography. Subsequent heat treatment of the lithographic patterns induces the growth of sub-100-nm structures including tips, rods, and flakes, all localized in the nanohole-array region. The coupled nanohole-array-nanostructure system comprises an efficient photoemitter. High-brightness photoemission is observed from this construct, following 780-nm femtosecond laser irradiation, using photoemission electron microscopy (PEEM). By comparing our PEEM observables to finite-difference time-domain simulations, we demonstrate that photoemission from the sub-100-nm structures is enhanced in the region of propagating surface plasmons launched from the nanohole arrays.

引用

页数：6

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