X-RAY DIFFRACTION AND ATOMIC FORCE MICROSCOPY STUDIES OF CHEMICAL BATH DEPOSITED FeS THIN FILMS

被引：0

作者：

Kassim, Anuar ^{[1
]}

Min, Ho Soon ^{[1
]}

Sharif, Atan ^{[1
]}

Nagalingam, Saravanan ^{[2
]}

机构：

[1] Univ Putra Malaysia, Fac Sci, Dept Chem, Serdang 43400, Selangor, Malaysia

[2] Univ Tunku Abdul Rahman, Fac Sci & Engn, Dept Biosci & Chem, Kuala Lumpur 53300, Malaysia

来源：

STUDIA UNIVERSITATIS BABES-BOLYAI CHEMIA | 2010年 / 55卷 / 03期

关键词：

chemical bath deposition; thin films; iron sulphide; X-ray diffraction; GROWTH; TEMPERATURE;

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

FeS thin films were deposited onto indium tin oxide glass substrates by chemical bath deposition method. The main objective of the paper was to investigate the influence of the bath temperature on the properties of thin films. The structural and morphological properties of the thin films were studied using X-ray diffraction and atomic force microscopy, respectively. According to XRD results, the number of FeS peaks increased to four peaks and the intensities of these peaks were improved for the films deposited at higher bath temperature. The AFM analysis showed that an increased in bath temperature allowed more materials to be deposited onto the substrate and thicker films to be formed.

引用

页码：5 / 11

页数：7

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