Mobility and metal-insulator transition of the two-dimensional electron gas in SiGe/Si/SiGe quantum wells

被引:16
作者
Gold, A. [1 ,2 ]
机构
[1] CNRS, CEMES, F-31055 Toulouse, France
[2] Univ Toulouse 3, UFR PCA, F-31062 Toulouse, France
关键词
LOCAL-FIELD CORRECTION; PARTICLE RELAXATION-TIME; SCATTERING; TRANSPORT;
D O I
10.1063/1.3482058
中图分类号
O59 [应用物理学];
学科分类号
摘要
We consider the mobility of the interacting two-dimensional electron gas as realized in SiGe/Si/SiGe quantum wells. For zero temperature we calculate the mobility as function of the electron density for remote charged-impurity scattering and we take into account exchange-correlation effects and multiple-scattering effects. Multiple-scattering effects give rise to a metal-insulator transition at low electron density. Our calculation is in good agreement with experimental results obtained with remote doped SiGe/Si/SiGe quantum wells having electron densities near the metal-insulator transition. We discuss the critical density of the metal-insulator transition as function of the remote doping distance and make some predictions. The single-particle relaxation time and spin-polarization effects are also considered. (C) 2010 American Institute of Physics. [doi:10.1063/1.3482058]
引用
收藏
页数:5
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