Modeling and design of the high performance step SOI-LIGBT power devices by partition mid-point method

被引:9
作者
Chang, FL [1 ]
Lin, MJ
Lee, GY
Chen, YS
Liaw, CW
Cheng, HC
机构
[1] Natl Tsing Hua Univ, Dept Elect Engn, Hsinchu, Taiwan
[2] Natl Chiao Tung Univ, Dept Elect Engn, Hsinchu, Taiwan
[3] Ind Technol Res Inst, Hsinchu, Taiwan
关键词
step drift doping profile; linearly graded doping; SOI-LIGBT;
D O I
10.1016/S0038-1101(03)00143-6
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this paper, a partition method is proposed to Study the high voltage devices with the step doping profile for the first time. It has been proposed that its breakdown voltage can be approached to that of the linearly graded devices with similar forward voltage drop (V-cc). In addition, by this method, the breakdown voltage can be deduced and its corresponding issue location is also fingered out in the step drift region. Furthermore. in order to reduce the undesirable additional masks, the degraded factor (D) is developed to obtain better performance with the least number of frames. Eventually, a 660 V step analytical results are compared with a 606.6 V MEDICI Simulation and this shows that the partition method is very effective. (C) 2003 Elsevier Ltd. All rights reserved.
引用
收藏
页码:1693 / 1698
页数:6
相关论文
共 8 条
[1]   CALCULATION OF AVALANCHE BREAKDOWN VOLTAGES OF SILICON P-N JUNCTIONS [J].
FULOP, W .
SOLID-STATE ELECTRONICS, 1967, 10 (01) :39-&
[2]   Spatial temperature profiles due to nonuniform self-heating in LDMOS's in thin SOI [J].
Leung, YK ;
Kuehne, SC ;
Huang, VSK ;
Nguyen, CT ;
Paul, AK ;
Plummer, JD ;
Wong, SS .
IEEE ELECTRON DEVICE LETTERS, 1997, 18 (01) :13-15
[3]   Lateral IGBT in thin SOI for high voltage, high speed power IC [J].
Leung, YK ;
Paul, AK ;
Plummer, JD ;
Wong, SS .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1998, 45 (10) :2251-2254
[4]  
MERCHANT S, 1991, ISPSD 91, P31
[5]  
SUNKAVALLI R, 1995, SOI C 1995 P 1995 IE, P139
[6]  
UDREA F, 2000, ELECT COMMUN ENG FEB
[7]   SHORT-CHANNEL EFFECT IN FULLY DEPLETED SOI MOSFETS [J].
YOUNG, KK .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1989, 36 (02) :399-402
[8]   Numerical modeling of linear doping profiles for high-voltage thin-film SOI devices [J].
Zhang, SD ;
Sin, JKO ;
Lai, TML ;
Ko, PK .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1999, 46 (05) :1036-1041