Observation of dd excitations in NiO and NiCl2 using K-edge resonant inelastic x-ray scattering

被引：19

作者：

van Veenendaal, Michel ^{[1
,2
]}

Liu, Xiaosong ^{[3
]}

Carpenter, Matthew H. ^{[4
]}

Cramer, Stephen P. ^{[3
,4
]}

机构：

[1] No Illinois Univ, Dept Phys, De Kalb, IL 60115 USA

[2] Argonne Natl Lab, Adv Photon Source, Argonne, IL 60439 USA

[3] Univ Calif Berkeley, Lawrence Berkeley Lab, Phys Biosci Div, Berkeley, CA 94720 USA

[4] Univ Calif Davis, Dept Appl Sci, Davis, CA 95616 USA

来源：

PHYSICAL REVIEW B | 2011年 / 83卷 / 04期

关键词：

SPECTROSCOPY;

D O I：

10.1103/PhysRevB.83.045101

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The presence of dd excitations in K-edge resonant inelastic x-ray scattering in the 1s -> 4p region of transition-metal compounds and their excitation mechanism is established through measurements of NiO and NiCl2. It is demonstrated that the valence excitations are due to the interaction between the excited 4p electron and the 3d valence electrons. A detailed analytical framework for interpreting these excitations in transition-metal compounds is presented, demonstrating a strong angular dependence for different dd excitations.

引用

页数：6

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