Mechanical response of ZrxCu100-x layer on Cu(001) substrate using molecular dynamics

被引:10
作者
Anh-Vu Pham [1 ,2 ]
Fang, Te-Hua [1 ]
Van-Thuc Nguyen [1 ,3 ]
Chen, Tao-Hsing [1 ]
机构
[1] Natl Kaohsiung Univ Sci & Technol, Dept Mech Engn, Kaohsiung 807, Taiwan
[2] Hung Yen Univ Technol & Educ, Fac Mech Engn, Khoai Chau Dist, Hung Yen Provin, Vietnam
[3] Ho Chi Minh City Univ Technol & Educ, Fac Mech Engn, Ho Chi Minh City, Vietnam
关键词
Molecular dynamics; Structure; Intermixing; Deformation; Zr content; Scratching depth; METALLIC-GLASS; THIN-FILM; DEFORMATION-BEHAVIOR; PLASTIC-DEFORMATION; BINARY CU; SIMULATION; NANOINDENTATION; INDENTATION; PERFORMANCE; DEPOSITION;
D O I
10.1016/j.tsf.2021.138954
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The molecular dynamics simulations method is applied to survey the deposition and annealing processes of ZrxCu100-x film on a Cu(001) surface. The influences of ZrxCu100-x compositions and depths on the force, deformation behavior, pile-up, and hardness are investigated using nano scratching and nanoindentation processes. We find out that the structure of ZrxCu100-x alloy has stability increases when decreasing the Zr content. The surface roughness of Zr-Cu film increases when improving the Zr content. After annealing, the morphology surface of the Zr-Cu amorphous alloy becomes smoother. The scratching forces and average friction coefficient of the Zr20Cu80 film surge as the scratching depth rises. While the pile-up height, normal force, and friction force decrease as increasing the Zr ratio. Under the plastic and elastic deformations, shear transformation zones are formed in the Zr-Cu amorphous film. While in the nanoindentation process, the hardness of ZrxCu100-x film amorphous film tends to decrease when increasing the Zr content.
引用
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页数:17
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