Analysis of the forward and reverse bias I-V characteristics on Au/PVA: Zn/n-Si Schottky barrier diodes in the wide temperature range

被引:51
作者
Tascioglu, Ilke [1 ]
Aydemir, Umut [1 ]
Altindal, Semsettin [1 ]
Kinaci, Baris [1 ]
Ozcelik, Suleyman [1 ]
机构
[1] Gazi Univ, Dept Phys, Fac Arts & Sci, TR-06500 Ankara, Turkey
关键词
CURRENT-VOLTAGE CHARACTERISTICS; SERIES RESISTANCE; INTERSECTING BEHAVIOR; INTERFACE STATES; ELECTRICAL CHARACTERISTICS; ELECTRONIC PARAMETERS; HEIGHT; DEPENDENCE; IRRADIATION; MECHANISMS;
D O I
10.1063/1.3552599
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this study, the forward and reverse bias current-voltage (I-V) characteristics of Au/Zinc acetate doped polyvinyl alcohol/n-Si Schottky barrier diodes (SBDs) have been investigated over the temperature range of 80-400 K. The values of zero-bias barrier height evaluated from forward and reverse bias I-V data, (Phi(BFo)) and (Phi(BRo)), increase with increasing temperature, and a discrepancy is observed between the values of Phi(BFo) and Phi(BRo). Because the apparent barrier height (BH) seen from metal to semiconductor is higher than the one seen from semiconductor to metal, the obtained value of Phi(BFo) is always greater than Phi(BRo) value. The difference between them is almost the same as the Fermi energy level. The crossing of the experimental forward bias semilogarithmic ln I-V plots appears as an abnormality when compared to the conventional behavior of ideal SBDs. This behavior was attributed to the lack of free charge at a low temperature and could be expected in the temperature region where there is no carrier freezing out, which is non-negligible at low temperatures. Prior to intersection, the voltage dependent value of resistance (R-i) obtained from Ohm's law decreases with increasing temperature, but it begins to increase after this intersection point. Such an increase in Phi(Bo) and series resistance (R-s) with temperature corresponding to high voltage region is in obvious disagreement with the reported negative temperature coefficients. However, the value of shunt resistance (R-sh) corresponding to a low or negative voltage region decreases with increasing temperature. In addition, the temperature dependent energy density distribution profiles of interface states (N-ss) were obtained from forward bias I-V measurements by taking into account the bias dependence of the effective barrier height (Phi(e)) and R-s of the device, and the values of Nss without considering Rs are almost one order of magnitude larger than N-ss when considering Rs value. (C) 2011 American Institute of Physics. [doi:10.1063/1.3552599]
引用
收藏
页数:8
相关论文
共 58 条
[1]   Junction properties of metal/polypyrrole Schottky barriers [J].
Abthagir, PS ;
Saraswathi, R .
JOURNAL OF APPLIED POLYMER SCIENCE, 2001, 81 (09) :2127-2135
[2]   The calculation of electronic parameters of an Ag/chitin/n-Si Schottky barrier diode [J].
Akkilic, K. ;
Aydin, M. E. ;
Uzun, I. ;
Kilicoglu, T. .
SYNTHETIC METALS, 2006, 156 (14-15) :958-962
[3]   Au/GaAs(100) interface Schottky barrier modification by a silicon nitride intralayer [J].
Almeida, J ;
Coluzza, C ;
dellOrto, T ;
Margaritondo, G ;
Terrasi, A ;
Ivanco, J .
JOURNAL OF APPLIED PHYSICS, 1997, 81 (01) :292-296
[4]   The calculation of electronic parameters of an Au/β-carotene/n-Si Schottky barrier diode [J].
Aydin, M. E. ;
Kilicoglu, T. ;
Akkilic, K. ;
Hosgoren, H. .
PHYSICA B-CONDENSED MATTER, 2006, 381 (1-2) :113-117
[5]   The importance of the series resistance in calculating the characteristic parameters of the Schottky contacts [J].
Aydin, M. E. ;
Akkilic, K. ;
Kilicoglu, T. .
APPLIED SURFACE SCIENCE, 2006, 253 (03) :1304-1309
[6]   On the barrier inhomogeneities of polyaniline/p-Si/Al structure at low temperature [J].
Aydogan, S ;
Saglam, M ;
Türüt, A .
APPLIED SURFACE SCIENCE, 2005, 250 (1-4) :43-49
[7]   Barrier height enhancement in the Au/n-GaAs Schottky diodes with anodization process [J].
Biber, M ;
Temirci, C ;
Türüt, A .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (01) :10-13
[8]   Current-voltage and capacitance-voltage characteristics of Sn/rhodamine-101/n-Si and Sn/rhodamine-101/p-Si Schottky barrier diodes [J].
Cakar, Muzaffer ;
Yildirim, Nezir ;
Karatas, Sukru ;
Temirci, Cabir ;
Turut, Abdulmecit .
JOURNAL OF APPLIED PHYSICS, 2006, 100 (07)
[9]   STUDIES OF TUNNEL MOS DIODES .1. INTERFACE EFFECTS IN SILICON SCHOTTKY DIODES [J].
CARD, HC ;
RHODERICK, EH .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1971, 4 (10) :1589-+