Analysis of nano-grating-assisted light absorption enhancement in metal-semiconductor-metal photodetectors patterned using focused ion-beam lithography

被引：49

作者：

Das, Narottam ^{[1
]}

Karar, Ayman ^{[1
]}

Vasiliev, Mikhail ^{[1
]}

Tan, Chee Leong ^{[2
]}

Alameh, Kamal ^{[1
,3
,4
]}

Lee, Yong Tak ^{[2
,3
,4
]}

机构：

[1] Edith Cowan Univ, Electron Sci Res Inst, Joondalup, WA 6027, Australia

[2] GIST, Sch Photon Sci, Kwangju 500712, South Korea

[3] GIST, Dept Informat & Commun, Kwangju 500712, South Korea

[4] GIST, Dept Nanobio Mat & Elect, Kwangju 500712, South Korea

来源：

OPTICS COMMUNICATIONS | 2011年 / 284卷 / 06期

关键词：

MSM photodetectors; Surface plasmons; Plasmonic nano-gratings; Absorption enhancement; FDTD analysis; OPTICAL-TRANSMISSION;

D O I：

10.1016/j.optcom.2010.11.065

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present finite-difference time-domain (FDTD) analysis results of light absorption enhancement factor dependence on the profile shape of nano-gratings etched into the surfaces of metal-semiconductor-metal photodetector (MSM-PD) structures. The MSM-PDs patterned by nano-gratings are optimized geometrically. improving the light absorption near the design wavelength through plasmon-assisted electric field concentration effects. FDTD simulation results show about 50 times light absorption enhancement prediction for 850 nm light due to improved optical signal propagation through the nano-gratings in comparison with the conventional MSM-PD designs employing only a subwavelength aperture. We also report on the nano-grating profile shapes obtained typically in our experiments using focused ion-beam lithography and discuss the dependency of light absorption enhancement on the geometric parameters of nano-gratings inscribed into MSM-PDs. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：1694 / 1700

页数：7

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