Analysis of nano-grating-assisted light absorption enhancement in metal-semiconductor-metal photodetectors patterned using focused ion-beam lithography

被引：48
作者：
Das, Narottam [1 ]
Karar, Ayman [1 ]
Vasiliev, Mikhail [1 ]
Tan, Chee Leong [2 ]
Alameh, Kamal [1 ,3 ,4 ]
Lee, Yong Tak [2 ,3 ,4 ]
机构：
[1] Edith Cowan Univ, Electron Sci Res Inst, Joondalup, WA 6027, Australia
[2] GIST, Sch Photon Sci, Kwangju 500712, South Korea
[3] GIST, Dept Informat & Commun, Kwangju 500712, South Korea
[4] GIST, Dept Nanobio Mat & Elect, Kwangju 500712, South Korea
来源：
OPTICS COMMUNICATIONS | 2011年 / 284卷 / 06期
关键词：
MSM photodetectors; Surface plasmons; Plasmonic nano-gratings; Absorption enhancement; FDTD analysis; OPTICAL-TRANSMISSION;
D O I：
10.1016/j.optcom.2010.11.065
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We present finite-difference time-domain (FDTD) analysis results of light absorption enhancement factor dependence on the profile shape of nano-gratings etched into the surfaces of metal-semiconductor-metal photodetector (MSM-PD) structures. The MSM-PDs patterned by nano-gratings are optimized geometrically. improving the light absorption near the design wavelength through plasmon-assisted electric field concentration effects. FDTD simulation results show about 50 times light absorption enhancement prediction for 850 nm light due to improved optical signal propagation through the nano-gratings in comparison with the conventional MSM-PD designs employing only a subwavelength aperture. We also report on the nano-grating profile shapes obtained typically in our experiments using focused ion-beam lithography and discuss the dependency of light absorption enhancement on the geometric parameters of nano-gratings inscribed into MSM-PDs. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码：1694 / 1700
页数：7
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