Effects of substrate treatment on the initial growth mode of indium-tin-oxide films

被引:27
作者
Han, YG
Kim, D
Cho, JS
Beag, YW
Koh, SK
Chernysh, VS
机构
[1] Korea Univ, Dept Mat Sci & Engn, Seoul 136701, South Korea
[2] P&I Corp Ltd, Korea & Res Dev Ctr, Seoul 131221, South Korea
[3] Moscow MV Lomonosov State Univ, Fac Phys, Moscow 119899, Russia
关键词
D O I
10.1063/1.1835003
中图分类号
O59 [应用物理学];
学科分类号
摘要
The initial growth mode of indium tin oxide (ITO) on polycarbonate (PC) substrates was investigated. Some of the PC substrates were bombarded by 1-keV Ar ions in an oxygen environment to modify the substrate surface before ITO sputter deposition. The initial part of the film growth was transformed from a three-dimensional island growth to a two-dimensional like growth as a result of the surface treatment. The change of the growth mode was attributed to oxygen-bound functional groups newly formed on the PC surface. Models based on thermodynamic theory and on atomic kinetic approach are presented to explain the transition, respectively. (C) 2005 American Institute of Physics.
引用
收藏
页数:6
相关论文
共 21 条
  • [1] SURFACE-CHEMISTRY OF POLYCARBONATE FILM AND ADHESION OF ULTRAVIOLET-CURED INKS
    BURRELL, MC
    TILLEY, MG
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1994, 12 (04): : 2507 - 2514
  • [2] Deposition of indium tin oxide films on polycarbonate substrates by using ion beam processes
    Cho, JS
    Koh, SK
    Yoon, KH
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2003, 21 (05): : 2060 - 2066
  • [3] Effect of oxygen gas on polycarbonate surface in keV energy Ar+ ion irradiation
    Cho, JS
    Choi, WK
    Jung, HJ
    Koh, SK
    Yoon, KH
    [J]. JOURNAL OF MATERIALS RESEARCH, 1997, 12 (01) : 277 - 282
  • [4] LOW RESISTIVITY INDIUM TIN OXIDE TRANSPARENT CONDUCTIVE FILMS .1. EFFECT OF INTRODUCING H2O GAS OF H2 GAS DURING DIRECT-CURRENT MAGNETRON SPUTTERING
    ISHIBASHI, S
    HIGUCHI, Y
    OTA, Y
    NAKAMURA, K
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (03): : 1399 - 1402
  • [5] Low temperature deposition of ITO thin films by ion beam sputtering
    Kim, D
    Han, Y
    Cho, JS
    Koh, SK
    [J]. THIN SOLID FILMS, 2000, 377 : 81 - 86
  • [6] STRUCTURE AND CONDUCTANCE EVOLUTION OF VERY THIN INDIUM OXIDE-FILMS
    KOROBOV, V
    LEIBOVITCH, M
    SHAPIRA, Y
    [J]. APPLIED PHYSICS LETTERS, 1994, 65 (18) : 2290 - 2292
  • [7] Lewis B., 1978, NUCLEATION GROWTH TH, P1
  • [8] Room-temperature growth of crystalline indium tin oxide films on glass using low-energy oxygen-ion-beam assisted deposition
    Liu, C
    Matsutani, T
    Asanuma, T
    Murai, K
    Kiuchi, M
    Alves, E
    Reis, M
    [J]. JOURNAL OF APPLIED PHYSICS, 2003, 93 (04) : 2262 - 2266
  • [9] LUTH H, 1995, SURFACES INTERFACES, P114
  • [10] THIN METALLIC OXIDES AS TRANSPARENT CONDUCTORS
    MANIFACIER, JC
    [J]. THIN SOLID FILMS, 1982, 90 (03) : 297 - 308