Optical and Structure Properties for Nano Titanium Oxide Thin Film Prepared by PLD

Nano titanium oxide thin films has been deposited on glass substrates at different laser energies between (700-1000) mJ using a pulsed laser deposition technique to ablation of TiO2 target at constant substrate temperature of (373K) using Q-switch Nd-YAG laser with lambda= 532 nm. The structure and optical properties of these films have been investigated, the films crystallize in a tetragonal structure and X-ray diffraction measurements have shown that the polycrystalline TiO2 prepared at laser energy 800 mJ is the optimum with high intensity at R (110). Also prepared include Optical transmission and absorption measurement, surface uniformity measurement of these films. The results films show that transparency reached to about (60) % can be achieved with TiO2 film which itself decreases sharply with the increasing of Laser energy while the optical band gap is (3.55-3.9) eV at optimum Laser energy in all results 800mJ.