Microstructure and growth mechanism of SiC whiskers on carbon/carbon composites prepared by CVD

被引:60
作者
Fu, QG [1 ]
Li, HJ [1 ]
Shi, XH [1 ]
Li, KZ [1 ]
Hu, ZB [1 ]
Jian, W [1 ]
机构
[1] Northwestern Polytech Univ, CC Composites Technol Res Ctr, Xian 710072, Shaanxi, Peoples R China
基金
中国国家自然科学基金;
关键词
CVD; SiC whisker; microstructure; growth mechanism; carbon/carbon composites;
D O I
10.1016/j.matlet.2005.02.088
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The SiC whiskers of good quality are expected to act as the reinforcing element in the ceramic coatings for C/C composites. Using CH3SiCl3(MTS) and H-2 as the precursors, SiC whiskers were prepared on the surface of C/C composites by chemical vapor deposition (CVD) at normal atmosphere pressure. XRD, SEM and TEM analyses show that the whiskers are beta-SiC structure and their diameters are several-hundred nanometers. With the descending MTS concentration in the depositing room, the purity of the as-prepared whiskers increases and the diameters of the whiskers decrease. The investigation of growth mechanism shows the CVD-SiC whiskers grown up by the vapor-solid (VS) growth process. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:2593 / 2597
页数:5
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