Enhancement of rutile phase formation in TiO2 films deposited on stainless steel substrates with a vacuum arc

被引:2
作者
Franco Arias, L. M. [1 ]
Kleiman, A. [1 ]
Vega, D. [2 ,3 ]
Fazio, M. [1 ]
Halac, E. [2 ,3 ]
Marquez, A. [1 ]
机构
[1] Univ Buenos Aires, Inst Fis Plasma, CONICET, Dept Fis,Fac Ciencias Exactas & Nat, Cdad Univ Pab 1, RA-1428 Buenos Aires, DF, Argentina
[2] Comis Nacl Energia Atom, Dept Fis Mat Condensada Gerencia Invest & Aplicac, Ave Gral Paz, RA-1499 Buenos Aires, DF, Argentina
[3] Univ Nacl San Martin, Escuela Ciencia & Tecnol, Villa Lynch, Buenos Aires, Argentina
关键词
Titanium dioxide; Rutile; Cathodic arc; Austenitic stainless steel; THIN-FILMS; TITANIUM; TRANSFORMATION; ANATASE; SIZE;
D O I
10.1016/j.tsf.2017.07.047
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The rutile phase of TiO2 has raised a wide interest for biomaterial applications. Since rutile is generally synthesized at high temperatures, a deposition process based on a cathodic arc discharge has been investigated in order to obtain rutile coatings at lower temperature on stainless steel substrates. In this work, TiO2 films were deposited on AISI 316 L stainless steel substrates heated at 300 and 400 degrees C with a negative bias of 120 V, employing Ti interlayers of different thicknesses. TiO2 films of approximately 500 and 900 nm were grown on Ti interlayers with thicknesses in the range 0-550 nm. The effect of Ti interlayers on the crystalline structure of TiO2 coatings was systematically studied with X-ray diffraction and Raman spectroscopy. The introduction of the Ti layer increased the rutile/anatase proportion either at 300 or 400 degrees C, turning rutile into the main phase in the TiO2 film. The largest amount of rutile for both temperatures was attained with a 55 nm Ti interlayer, the thinnest thickness studied. (C) 2017 Published by Elsevier B.V.
引用
收藏
页码:269 / 276
页数:8
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