Femto- and nanosecond laser treatment of doped polymethylmethacrylate

被引：46
作者：
Krüger, J
Martin, S
Mädebach, H
Urech, L
Lippert, T
Wokaun, A
Kautek, W
机构：
[1] Fed Inst Mat Res & Testing, Lab Thin Film Technol, D-12205 Berlin, Germany
[2] Paul Scherrer Inst, Dept Gen Energy, CH-5232 Villigen, Switzerland
[3] Univ Vienna, Inst Phys Chem, A-1090 Vienna, Austria
来源：
APPLIED SURFACE SCIENCE | 2005年 / 247卷 / 1-4期
关键词：
laser ablation; laser beam machining; doping thin films; polymers-radiation effects;
D O I：
10.1016/j.apsusc.2005.01.078
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Femto- and nanosecond laser ablation of polymethylmethacrylate (PMMA) and PMMA doped with a linear absorber was investigated in the infrared spectral region. Ablation thresholds were determined and incubation phenomena were identified. The 'degree' of incubation was calculated employing a phenomenological model. The influence of the pulse duration on the machining quality of the polymers was examined. The presence of an absorbing chromophore is not a prerequisite for a controllable fs-laser structuring in contrast to the ns-treatment. Surface swelling always accompanied ablation. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码：406 / 411
页数：6
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