A monolithically integrated micro-LED display based on GaN-on-silicon substrate

被引:25
作者
Jung Hun, Choi [1 ]
Lee, Seung Jun [1 ]
Kwon, Kyu Oh [1 ]
Choi, Jae Yong [1 ]
Jung, Taeil [1 ]
Han, Myungsoo [1 ]
Han, Seung Jun [1 ]
机构
[1] LG Display, Display Res Ctr, Seoul 07796, South Korea
关键词
LIGHT-EMITTING-DIODES; HEMT;
D O I
10.7567/1882-0786/ab64ff
中图分类号
O59 [应用物理学];
学科分类号
摘要
A monolithic micro-LED display technology is proposed using a gallium-nitride-on-silicon substrate. An active matrix (AM) display was realized by interconnecting nitride-based LEDs as display pixels with Si thin-film transistors (TFTs) as driving circuitries. MOS TFTs were fabricated on a Si surface which had been exposed after dry etching of the LED epitaxial layer. The mobility and sub-threshold slope were measured as 354.3 cm(2) V-1 s(-1) and 0.64 V dec(-1), respectively. A 150 pixel-per-inch 0.6 inch monolithic display was demonstrated with a 60 x 60 pixel array AM display by an integration technology on the same substrate.
引用
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页数:4
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