Three indazole derivatives as corrosion inhibitors of copper in a neutral chloride solution

被引：323

作者：

Qiang, Yujie ^{[1
,2
]}

Zhang, Shengtao ^{[1
,4
]}

Yan, Song ^{[3
]}

Zou, Xuefeng ^{[1
]}

Chen, Shijin ^{[5
]}

机构：

[1] Chongqing Univ, Sch Chem & Chem Engn, Chongqing 400044, Peoples R China

[2] Sichuan Univ Sci & Engn, Sch Chem Engn, Zigong 643000, Peoples R China

[3] China Univ Petr, Natl Engn Lab Pipeline Safety, Beijing 102249, Peoples R China

[4] Mat Corros & Protect Key Lab Sichuan Prov, Zigong 643000, Peoples R China

[5] Bomin Elect Ltd, Meizhou 514021, Peoples R China

来源：

CORROSION SCIENCE | 2017年 / 126卷

基金：

中国国家自然科学基金;

关键词：

Copper; Corrosion inhibitor; AFM; EIS; Modelling studies; MILD-STEEL; CARBON-STEEL; SUPERHYDROPHOBIC SURFACES; BENZIMIDAZOLE DERIVATIVES; GREEN INHIBITORS; IONIC LIQUIDS; ACID; HCL; ADSORPTION; BENZOTRIAZOLE;

D O I：

10.1016/j.corsci.2017.07.012

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

In this work, three halogeno-indazole compounds were investigated for corrosion inhibition of copper in 3.0 wt % NaCl solution using potentiodynamic polarization measurement, electrochemical impedance spectroscopy, and X-ray diffraction (XRD) analysis. The electrochemical results revealed that all of these organics are mixed type inhibitors with an inhibitive ability order: 4-CIA > 4-BIA > 4-FIA, which was further confirmed by observations with field emission scanning electron microscope (FE-SEM) and atomic force microscope (AFM). Their favourable performance is ascribed to the formation of inhibitor-adsorption films on copper. Furthermore, theoretical calculations showed the electronic structure of studied compounds and their optimized adsorption configurations on the copper surface.

引用

页码：295 / 304

页数：10

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