Formation of uniform passive oxide layers on high Si content Al alloy by plasma electrolytic oxidation

被引:39
作者
Hwang, In Jun [1 ]
Hwang, Duck Young [1 ]
Kim, Yong Min [1 ]
Yoo, Bongyoung [1 ]
Shin, Dong Hyuk [1 ]
机构
[1] Hanyang Univ, Dept Mat Sci & Engn, Ansan 425791, South Korea
关键词
Al-Si alloy; Plasma electrolytic oxidation; Vanadium; Surface modification; MICROARC OXIDATION; SILICATE SOLUTION; ALUMINUM-ALLOY; GROWTH-PROCESS; COATINGS; FILMS;
D O I
10.1016/j.jallcom.2010.02.074
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this research, we demonstrated the successful fabrication of conformal passive oxide layers on a high Si content Al alloy by a plasma electrolytic oxidation (PEO) process. The PEO process of Al-12 wt% Si alloy was performed in an electrolyte containing sodium hexametaphosphate ((NaPO(3))(6)) andammonium metavanadate (NH(4)VO(3)), and the variation of the morphology of the electrochemically generated oxide layer was investigated. When NH(4)VO(3) was added to electrolyte, the oxide layer uniformly covered the entire surface of Al-12 wt% Si alloy, and the synthesized oxide layer was confirmed to be a mixture of Al(2)O(3), V(2)O(3) and V(2)O(5). In addition, the oxide layer exhibited a uniform black color, and this is expected to solve the problem of non-uniform colorizing caused by different oxidation behaviors of Si-rich phases during surface treatment. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:S527 / S530
页数:4
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