Influence of pulse plating parameters on morphology and hardness of pure tin deposit

被引：20

作者：

Hansal, W. E. G. ^{[1
]}

Halmdienst, M. ^{[1
]}

Hansal, S. ^{[1
]}

Boussaboua, I. ^{[1
,2
]}

Darchen, A. ^{[2
]}

机构：

[1] Happy Plating GmbH, A-2544 Leobersdorf, Austria

[2] Ecole Natl Super Chim Rennes, Lab Electrochim, F-35700 Rennes, France

来源：

TRANSACTIONS OF THE INSTITUTE OF METAL FINISHING | 2008年 / 86卷 / 02期

关键词：

tin; alkaline stannate electrolyte; pulse plating; microhardness;

D O I：

10.1179/174591908X272960

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

In the present work, the electrochemical deposition of tin coatings using pulse plating techniques was investigated. Based on fundamental electrochemical experiments, pure tin coatings were deposited by using direct and pulsed current. Both types of deposits were compared with each other and the effects of the pulse plating parameters, i.e. duty cycle, frequency and current density were investigated. Matt layers with wide powdery areas are obtained with direct current. At low current density and low duty cycle (10%), the pulsed current improves this aspect of the deposit by reducing the formation of powdery deposits. At higher duty cycles, the increase in the frequency additionally improves the hardness of the coating.

引用

页码：115 / 121

页数：7

共 12 条

[1] Characterization of passive films on tin through transient electrochemical techniques [J].