Plasma deposition for antimicrobial finishing of cellulosic textiles

In this study, ethylenediamine was deposited onto cotton fabrics with plasma technology under vacuum conditions with the aim to introduce nitrogen-containing groups onto the surface of cotton fabrics. Then, chlorine was introduced into the nitrogen-containing groups on the cotton fabrics in order to make it antimicrobial by chlorination with sodium hypochlorite solution. XPS, SEM, reflective spectrum were used to evaluate the surface properties, including the variation of groups and elements on cotton fabrics as well as the surface topography of the cotton fabrics after modification. The tearing strength, weight change and antimicrobial property of the modified fabric were also characterized. The results showed that plasma deposition with ethylenediamine under vacuum conditions introduces nitrogen-containing groups onto cotton fabrics, the fabrics inhibit bacteria, Staphylococcus aureus (S. aureus) and Escherichia coli (E. coli) after chlorination with sodium hypochlorite, and the antibacterial property is durable. Therefore, the plasma deposition with ethylenediamine for the antimicrobial finishing of cotton fabrics, as an environmentally friendly process, is a method worth investigating further.