Properties of films obtained by ion-beam sputtering

被引:2
作者
Muranova, GA [1 ]
Smirnov, NN [1 ]
机构
[1] SI Vavilov State Opt Inst, St Petersburg, Russia
关键词
D O I
10.1364/JOT.68.000282
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
This paper presents a study of films obtained by sputtering targets made from optical glasses and oxides with an ion beam created by a self-contained ion source. It is shown that the films deposited by this method have a homogeneous fine-grained structure and high adhesion to the substrate. The optical constants of the films are determined. It is shown that films of optical glasses can be obtained with optical parameters close to those of the original glass. The main mechanisms by which radiation losses occur in the films are revealed, and ways of reducing them are proposed. It is established that the radiation-loss coefficient in films obtained by ion-beam sputtering is an order of magnitude Lower than those of films obtained by electron-beam evaporation. The films are promising for use in optical systems whose quality substantially depends on the radiation loss in the layers. (C) 2001 The Optical Society of America.
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收藏
页码:282 / 286
页数:5
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