New studies of reactive pulsed laser deposition

被引：1

作者：

Mihailescu, IN ^{[1
]}

Gyorgy, E ^{[1
]}

Teodorescu, VS ^{[1
]}

Marin, G ^{[1
]}

Pantelica, D ^{[1
]}

Andrei, A ^{[1
]}

Neamtu, J ^{[1
]}

机构：

[1] Natl Inst Laser Plasma & Radiat Phys, Bucharest 76900, Romania

来源：

FIFTH CONFERENCE ON OPTICS (ROMOPTO '97), PTS 1 AND 2 | 1998年 / 3405卷

关键词：

reactive pulsed laser deposition; titanium carbide thin films;

D O I：

10.1117/12.312749

中图分类号：

R318 [生物医学工程];

学科分类号：

0831 ;

摘要：

We report the synthesis and deposition of TiC films by reactive pulsed laser deposition. Ti targets have been submitted to multipulse UV laser action in low pressure CH4. The thin films were grown on a collector placed parallel to the: target. The films were characterized by electron microscopy, electron spectroscopy and nuclear techniques.

引用

页码：182 / 187

页数：6