Effect of Head Groups in Self-Assembled Monolayer Passivation on Properties of InSnZnO Thin-Film Transistors

被引:5
|
作者
Chen, Yayi [1 ,2 ]
Li, Bin [1 ,2 ]
Zhong, Wei [1 ,2 ]
Luo, Dongxiang [3 ]
Li, Guijun [4 ]
Zhou, Changjian [1 ,2 ]
Lan, Linfeng [5 ]
Chen, Rongsheng [1 ,2 ]
机构
[1] South China Univ Technol, Sch Microelect, Guangzhou 510640, Peoples R China
[2] Pazhou Lab, Guangzhou 510330, Peoples R China
[3] South China Normal Univ, Inst Semicond, Guangzhou 510640, Peoples R China
[4] Shenzhen Univ, Coll Phys & Optoelect Engn, Shenzhen 518060, Peoples R China
[5] South China Univ Technol, State Key Lab Luminescent Mat & Devices, Guangzhou 510640, Peoples R China
基金
中国国家自然科学基金;
关键词
Surface roughness; Rough surfaces; Surface morphology; Surface topography; Thin film transistors; Passivation; Uninterruptible power systems; Head groups; InSnZnO (ITZO); passivation layers (PVLs); self-assembled monolayer; thin-film transistor (TFT); STABILITY; METAL;
D O I
10.1109/TED.2021.3126568
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Self-assembled monolayers (SAMs) with three different head functional groups are prepared as passivation layers (PVLs) for amorphous InSnZnO (ITZO) thin-film transistors (TFTs). Head groups exhibit considerable modulation of surface topography and surface energy, leading to a difference in the passivation effect. This variation is attributed to the discrepancy of the binding methods determined by the head groups. Additionally, the head groups also modulate the relative direction and strength properties of dipoles at ITZO surface, which affects the surface potential and carrier density in ITZO films. As a consequence, the electric performance and stability of devices can be modulated by head groups in SAMs. These results provide a likely and low-cost method to ameliorate the capability of TFTs.
引用
收藏
页码:160 / 165
页数:6
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