Thermochromism of sputter deposited WxV1-xO2 films

被引:89
作者
Sobhan, MA
Kivaisi, RT
Stjerna, B
Granqvist, CG
机构
[1] RAJSHAHI UNIV,DEPT APPL PHYS & ELECT,RAJSHAHI 6205,BANGLADESH
[2] UNIV DAR ES SALAAM,DEPT PHYS,DAR ES SALAAM,TANZANIA
关键词
sputtering; X-ray diffraction; Rutherford backscattering spectrometry;
D O I
10.1016/S0927-0248(95)00051-8
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
Films of WxV1-xO2 were prepared by reactive de magnetron cosputtering. Structural and compositional analysis were performed by X-ray diffraction and Rutherford backscattering spectrometry. The thermochromic switching temperature, determined by optical measurements, decreased linearly with increasing x and lay at a comfort temperature for x being 0.05 to 0.06.
引用
收藏
页码:451 / 455
页数:5
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