Fabrication of adherent porous diamond films on sintered WC-13 wt.%Co substrates by bias enhanced hot filament chemical vapour deposition

被引：1

作者：

Wei, Q. ^{[1
,2
,3
]}

Ashfold, M. N. R. ^{[2
]}

Yu, Z. M. ^{[1
]}

Ma, L. ^{[3
]}

机构：

[1] Cent S Univ, Sch Mat Sci & Engn, Changsha 410083, Peoples R China

[2] Univ Bristol, Sch Chem, Bristol BS8 1TS, Avon, England

[3] Cent S Univ, State Key Lab Powder Met, Changsha 410083, Peoples R China

来源：

PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2011年 / 208卷 / 09期

关键词：

diamond films; HFCVD; porous; WC-Co; MICROWAVE PLASMA; FRETTING WEAR; THIN-FILMS; CVD; NUCLEATION; GROWTH; COATINGS; STEEL; FIELD; PRETREATMENTS;

D O I：

10.1002/pssa.201100007

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Porous diamond (PD) films have been grown on sintered WC-13 wt.%Co substrates by bias enhanced hot filament (HF) chemical vapour deposition (CVD) methods and characterized by scanning electron microscopy (SEM), laser Raman spectroscopy and X-ray diffraction (XRD). The PD films show excellent adhesion under Rockwell indentation testing. Factors encouraging the growth of diamond film with high porosity are discussed. (C) 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim

引用

页码：2033 / 2037

页数：5

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