Low dark current metal-semiconductor-metal ultraviolet photodetectors based on sol-gel-derived TiO2 films

被引:35
作者
Xie, Yannan [1 ,2 ]
Huang, Huolin [1 ,2 ]
Yang, Weifeng [3 ]
Wu, Zhengyun [1 ,4 ]
机构
[1] Xiamen Univ, Dept Phys, Xiamen 361005, Fujian, Peoples R China
[2] Xiamen Univ, Pen Tung Sah Micro Nano Technol Res Ctr, Xiamen 361005, Fujian, Peoples R China
[3] Natl Univ Singapore, Dept Mat Sci & Engn, Singapore 117576, Singapore
[4] Xiamen Univ, Fujian Key Lab Semicond Mat & Applicat, Xiamen 361005, Fujian, Peoples R China
关键词
THIN-FILMS; TITANIUM-DIOXIDE; PHOTOCATALYTIC ACTIVITY; TEMPERATURE; DEPOSITION; GAIN;
D O I
10.1063/1.3537918
中图分类号
O59 [应用物理学];
学科分类号
摘要
The titanium dioxide (TiO2) films prepared by sol-gel processing were used to fabricate metal-semiconductor-metal ultraviolet photodetectors. A very low dark current of 5.38 pA (current density of 3.84 nA/cm(2)) at 5 V bias is obtained, which is ascribed to the high effective Schottky barrier between Au and TiO2 films. The x-ray photoelectron spectroscopy analysis demonstrates that the concentration of oxygen vacancies is very low in the surface of the TiO2 films, which is responsible for the high effective Schottky barrier. The devices exhibit a cutoff wavelength at about 380 nm and a large UV-to-visible rejection ratio (340 versus 400 nm) of three orders of magnitude. The peak responsivity of the devices is 17.5 A/W at 5 V bias, indicating the presence of internal photoconductive gain induced by desorption of oxygen on the TiO2 surface. (C) 2011 American Institute of Physics. [doi:10.1063/1.3537918]
引用
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页数:4
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